Tampere University of Technology

TUTCRIS Research Portal

Sozaraj Rasappa

  1. Published

    Soft graphoepitaxy for large area directed self-assembly of polystyrene-block-poly(dimethylsiloxane) block copolymer on nanopatterned poss substrates fabricated by nanoimprint lithography

    Borah, D., Rasappa, S., Salaun, M., Zellsman, M., Lorret, O., Liontos, G., Ntetsikas, K., Avgeropoulos, A. & Morris, M. A., 1 Jun 2015, In : Advanced Functional Materials. 25, 22, p. 3425-3432 8 p.

    Research output: Contribution to journalArticleScientificpeer-review

  2. Published

    Block co-polymers for nanolithography: Rapid microwave annealing for pattern formation on substrates

    Borah, D., Rasappa, S., Senthamaraikannan, R., Holmes, J. D. & Morris, M. A., 2015, In : Polymers. 7, 4, p. 592-609 18 p.

    Research output: Contribution to journalArticleScientificpeer-review

  3. Published

    Graphoepitaxial Directed Self-Assembly of Polystyrene-Block-Polydimethylsiloxane Block Copolymer on Substrates Functionalized with Hexamethyldisilazane to Fabricate Nanoscale Silicon Patterns

    Borah, D., Rasappa, S., Senthamaraikannan, R., Holmes, J. D. & Morris, M. A., 1 Jun 2014, In : Advanced Materials Interfaces. 1, 3, 1300102.

    Research output: Contribution to journalArticleScientificpeer-review

  4. Published

    Soft-graphoepitaxy using nanoimprinted polyhedral oligomeric silsesquioxane substrates for the directed self-Assembly of PS-b-PDMS

    Borah, D., Simao, C. D., Senthamaraikannan, R., Rasappa, S., Francone, A., Lorret, O., Salaun, M., Kosmala, B., Kehagias, N., Zelsmann, M., Sotomayor-Torres, C. M. & Morris, M. A., Nov 2013, In : European Polymer Jounal. 49, 11, p. 3512-3521 10 p.

    Research output: Contribution to journalArticleScientificpeer-review

  5. Published

    Swift nanopattern formation of PS- b -PMMA and PS- b -PDMS block copolymer films using a microwave assisted technique

    Borah, D., Senthamaraikannan, R., Rasappa, S., Kosmala, B., Holmes, J. D. & Morris, M. A., 27 Aug 2013, In : ACS Nano. 7, 8, p. 6583-6596 14 p.

    Research output: Contribution to journalArticleScientificpeer-review

  6. Published

    Tuning PDMS brush chemistry by UV-O3 exposure for PS-b-PDMS microphase separation and directed self-assembly

    Borah, D., Rasappa, S., Senthamaraikannan, R., Holmes, J. D. & Morris, M. A., 16 Jul 2013, In : Langmuir. 29, 28, p. 8959-8968 10 p.

    Research output: Contribution to journalArticleScientificpeer-review

  7. Published

    Molecularly functionalized silicon substrates for orientation control of the microphase separation of PS-b-PMMA and PS-b-PDMS block copolymer systems

    Borah, D., Ozmen, M., Rasappa, S., Shaw, M. T., Holmes, J. D. & Morris, M. A., 5 Mar 2013, In : Langmuir. 29, 9, p. 2809-2820 12 p.

    Research output: Contribution to journalArticleScientificpeer-review

  8. Published

    The sensitivity of random polymer brush-lamellar polystyrene-b-polymethylmethacrylate block copolymer systems to process conditions

    Borah, D., Rasappa, S., Senthamaraikannan, R., Shaw, M. T., Holmes, J. D. & Morris, M. A., 1 Mar 2013, In : Journal of Colloid and Interface Science. 393, 1, p. 192-202 11 p.

    Research output: Contribution to journalArticleScientificpeer-review

  9. Published

    Orientation and alignment control of microphase-separated PS-b-PDMS substrate patterns via polymer brush chemistry

    Borah, D., Rasappa, S., Senthamaraikannan, R., Kosmala, B., Shaw, M. T., Holmes, J. D. & Morris, M. A., 9 Jan 2013, In : ACS Applied Materials and Interfaces. 5, 1, p. 88-97 10 p.

    Research output: Contribution to journalArticleScientificpeer-review

  10. Published

    Block copolymer self-assembly on ethylene glycol (EG) self-assembled monolayer (SAM) for nanofabrication

    Borah, D., Rasappa, S., Kosmala, B., Holmes, J. D. & Morris, M. A., 2012, Nanoscale Materials Modification by Photon, Ion, and Electron Beams. Vol. 1450. p. 8-13 6 p.

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

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