Tampere University of Technology

TUTCRIS Research Portal

Sozaraj Rasappa

  1. Published

    Soft graphoepitaxy for large area directed self-assembly of polystyrene-block-poly(dimethylsiloxane) block copolymer on nanopatterned poss substrates fabricated by nanoimprint lithography

    Borah, D., Rasappa, S., Salaun, M., Zellsman, M., Lorret, O., Liontos, G., Ntetsikas, K., Avgeropoulos, A. & Morris, M. A., 1 Jun 2015, In : Advanced Functional Materials. 25, 22, p. 3425-3432 8 p.

    Research output: Contribution to journalArticleScientificpeer-review

  2. Published

    Block co-polymers for nanolithography: Rapid microwave annealing for pattern formation on substrates

    Borah, D., Rasappa, S., Senthamaraikannan, R., Holmes, J. D. & Morris, M. A., 2015, In : Polymers. 7, 4, p. 592-609 18 p.

    Research output: Contribution to journalArticleScientificpeer-review

  3. Published

    Graphoepitaxial Directed Self-Assembly of Polystyrene-Block-Polydimethylsiloxane Block Copolymer on Substrates Functionalized with Hexamethyldisilazane to Fabricate Nanoscale Silicon Patterns

    Borah, D., Rasappa, S., Senthamaraikannan, R., Holmes, J. D. & Morris, M. A., 1 Jun 2014, In : Advanced Materials Interfaces. 1, 3, 1300102.

    Research output: Contribution to journalArticleScientificpeer-review

  4. Published

    Soft-graphoepitaxy using nanoimprinted polyhedral oligomeric silsesquioxane substrates for the directed self-Assembly of PS-b-PDMS

    Borah, D., Simao, C. D., Senthamaraikannan, R., Rasappa, S., Francone, A., Lorret, O., Salaun, M., Kosmala, B., Kehagias, N., Zelsmann, M., Sotomayor-Torres, C. M. & Morris, M. A., Nov 2013, In : European Polymer Jounal. 49, 11, p. 3512-3521 10 p.

    Research output: Contribution to journalArticleScientificpeer-review

  5. Published

    Swift nanopattern formation of PS- b -PMMA and PS- b -PDMS block copolymer films using a microwave assisted technique

    Borah, D., Senthamaraikannan, R., Rasappa, S., Kosmala, B., Holmes, J. D. & Morris, M. A., 27 Aug 2013, In : ACS Nano. 7, 8, p. 6583-6596 14 p.

    Research output: Contribution to journalArticleScientificpeer-review

  6. Published

    Tuning PDMS brush chemistry by UV-O3 exposure for PS-b-PDMS microphase separation and directed self-assembly

    Borah, D., Rasappa, S., Senthamaraikannan, R., Holmes, J. D. & Morris, M. A., 16 Jul 2013, In : Langmuir. 29, 28, p. 8959-8968 10 p.

    Research output: Contribution to journalArticleScientificpeer-review

  7. Published

    Molecularly functionalized silicon substrates for orientation control of the microphase separation of PS-b-PMMA and PS-b-PDMS block copolymer systems

    Borah, D., Ozmen, M., Rasappa, S., Shaw, M. T., Holmes, J. D. & Morris, M. A., 5 Mar 2013, In : Langmuir. 29, 9, p. 2809-2820 12 p.

    Research output: Contribution to journalArticleScientificpeer-review

  8. Published

    The sensitivity of random polymer brush-lamellar polystyrene-b-polymethylmethacrylate block copolymer systems to process conditions

    Borah, D., Rasappa, S., Senthamaraikannan, R., Shaw, M. T., Holmes, J. D. & Morris, M. A., 1 Mar 2013, In : Journal of Colloid and Interface Science. 393, 1, p. 192-202 11 p.

    Research output: Contribution to journalArticleScientificpeer-review

  9. Published

    Orientation and alignment control of microphase-separated PS-b-PDMS substrate patterns via polymer brush chemistry

    Borah, D., Rasappa, S., Senthamaraikannan, R., Kosmala, B., Shaw, M. T., Holmes, J. D. & Morris, M. A., 9 Jan 2013, In : ACS Applied Materials and Interfaces. 5, 1, p. 88-97 10 p.

    Research output: Contribution to journalArticleScientificpeer-review

  10. Published

    Block copolymer self-assembly on ethylene glycol (EG) self-assembled monolayer (SAM) for nanofabrication

    Borah, D., Rasappa, S., Kosmala, B., Holmes, J. D. & Morris, M. A., 2012, Nanoscale Materials Modification by Photon, Ion, and Electron Beams. Vol. 1450. p. 8-13 6 p.

    Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

  11. Published

    Plasma etch technologies for the development of ultra-small feature size transistor devices

    Borah, D., Shaw, M. T., Rasappa, S., Farrell, R. A., O'Mahony, C., Faulkner, C. M., Bosea, M., Gleeson, P., Holmes, J. D. & Morris, M. A., 4 May 2011, In : Journal of Physics D: Applied Physics. 44, 17, 174012.

    Research output: Contribution to journalArticleScientificpeer-review

  12. Published

    Self-assembly of polystyrene-block-poly(4-vinylpyridine) block copolymer on molecularly functionalized silicon substrates: Fabrication of inorganic nanostructured etchmask for lithographic use

    Cummins, C., Borah, D., Rasappa, S., Chaudhari, A., Ghoshal, T., O'Driscoll, B. M. D., Carolan, P., Petkov, N., Holmes, J. D. & Morris, M. A., 21 Dec 2013, In : Journal of Materials Chemistry C. 1, 47, p. 7941-7951 11 p.

    Research output: Contribution to journalArticleScientificpeer-review

  13. Published

    Self-Assembled Nanofeatures in Complex Three-Dimensional Topographies via Nanoimprint and Block Copolymer Lithography Methods

    Cummins, C., Borah, D., Rasappa, S., Senthamaraikannan, R., Simao, C., Francone, A., Kehagias, N., Torres, C. M. S. & Morris, M. A., 2017, In : ACS Omega. 2, 8, p. 4417-4423

    Research output: Contribution to journalArticleScientificpeer-review

  14. Published

    Tuning Localized Surface Plasmon Resonances by Self-Assembly in Multi- Metal Nanostructures

    Hulkkonen, H., Salminen, T., Rasappa, S. & Niemi, T., 17 Sep 2017.

    Research output: Other conference contributionPaper, poster or abstractScientific

  15. Published

    A facile route to synthesis of S-doped TiO2 nanoparticles for photocatalytic activity

    McManamon, C., O'Connell, J., Delaney, P., Rasappa, S., Holmes, J. D. & Morris, M. A., 30 May 2015, In : Journal of Molecular Catalysis A: Chemical. 406, p. 51-57!

    Research output: Contribution to journalArticleScientificpeer-review

  16. Published

    Depth profiling of PLGA copolymer in a novel biomedical bilayer using confocal raman spectroscopy

    McManamon, C., Delaney, P., Kavanagh, C., Wang, J. J., Rasappa, S. & Morris, M. A., 14 May 2013, In : Langmuir. 29, 19, p. 5905-5910 6 p.

    Research output: Contribution to journalArticleScientificpeer-review

  17. Published

    Study of the kinetics and mechanism of rapid self-assembly in block copolymer thin films during solvo-microwave annealing

    Mokarian-Tabari, P., Cummins, C., Rasappa, S., Simao, C., Torres, C. M. S., Holmes, J. D. & Morris, M. A., 2014, In : Langmuir. 30, 35, p. 10728-10739 12 p.

    Research output: Contribution to journalArticleScientificpeer-review

  18. Published

    A Highly Efficient Sensor Platform Using Simply Manufactured Nanodot Patterned Substrates

    Rasappa, S., Ghoshal, T., Borah, D., Senthamaraikannan, R., Holmes, J. D. & Morris, M. A., 20 Aug 2015, In : Scientific Reports. 5, 13270.

    Research output: Contribution to journalArticleScientificpeer-review

  19. Published

    High quality sub-10 nm graphene nanoribbons by on-chip PS-b-PDMS block copolymer lithography

    Rasappa, S., Caridad, J. M., Schulte, L., Cagliani, A., Borah, D., Morris, M. A., Bøggild, P. & Ndoni, S., 29 Jul 2015, In : RSC Advances. 5, 82, p. 66711-66717 7 p.

    Research output: Contribution to journalArticleScientificpeer-review

  20. Published

    Fabrication of 3-D nanodimensioned electric double layer capacitor structures using block copolymer templates

    Rasappa, S., Borah, D., Senthamaraikannan, R., Faulkner, C. C., Holmes, J. D. & Morris, M. A., 2014, In : Journal Nanoscience and Nanotechnology. 14, 7, p. 5221-5227 7 p.

    Research output: Contribution to journalArticleScientificpeer-review

  21. Published

    Rapid, Brushless Self-assembly of a PS-b-PDMS Block Copolymer for Nanolithography

    Rasappa, S., Schulte, L., Borah, D., Morris, M. A. & Ndoni, S., 1 Oct 2014, In : Colloids and Interface Science Communications. 2, p. 1-5 5 p.

    Research output: Contribution to journalArticleScientificpeer-review

  22. Published

    Sub-15 nm silicon lines fabrication via PS- B -PDMS block copolymer lithography

    Rasappa, S., Schulte, L., Borah, D., Morris, M. A. & Ndoni, S., 2013, In : Journal of Nanomaterials. 2013, 831274.

    Research output: Contribution to journalArticleScientificpeer-review

  23. Published

    Fabrication of germanium nanowire arrays by block copolymer lithography

    Rasappa, S., Borah, D., Senthamaraikannan, R., Faulkner, C. C., Wang, J. J., Holmes, J. J. & Morris, M. M., 2013, In : SCIENCE OF ADVANCED MATERIALS. 5, 7, p. 782-787 6 p.

    Research output: Contribution to journalArticleScientificpeer-review

  24. Published

    Fabrication of a sub-10 nm silicon nanowire based ethanol sensor using block copolymer lithography

    Rasappa, S., Borah, D., Faulkner, C. C., Lutz, T., Shaw, M. T., Holmes, J. D. & Morris, M. A., 15 Feb 2013, In : Nanotechnology. 24, 6, 065503.

    Research output: Contribution to journalArticleScientificpeer-review

  25. Published

    Block copolymer lithography: Feature size control and extension by an over-etch technique

    Rasappa, S., Borah, D., Senthamaraikannan, R., Faulkner, C. C., Shaw, M. T., Gleeson, P., Holmes, J. D. & Morris, M. A., 1 Nov 2012, In : Thin Solid Films. 522, p. 318-323 6 p.

    Research output: Contribution to journalArticleScientificpeer-review

  26. Published

    Morphology evolution of PS-b-PDMS block copolymer and its hierarchical directed self-assembly on block copolymer templates

    Rasappa, S., Schulte, L., Borah, D., Hulkkonen, H., Ndoni, S., Salminen, T., Senthamaraikanan, R., Morris, M. A. & Niemi, T., 15 May 2018, In : Microelectronic Engineering. 192, p. 1-7 7 p.

    Research output: Contribution to journalArticleScientificpeer-review

  27. Published

    Directed self-assembly of high-chi block copolymer for fabrication of optical nanoresonator

    Rasappa, S., Schulte, L., Ndoni, S. & Niemi, T., 3 Sep 2018, In : Nanoscale. 10, p. 18306-18314 9 p.

    Research output: Contribution to journalArticleScientificpeer-review

  28. Published

    High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures

    Rasappa, S., Hulkkonen, H., Schulte, L., Ndoni, S., Reuna, J., Salminen, T. & Niemi, T., 2019, In : Journal of Colloid and Interface Science. 534, 15, p. 420-429 10 p.

    Research output: Contribution to journalArticleScientificpeer-review

  29. Published

    An etching mask and a method to produce an etching mask

    Rasappa, S., 11 Oct 2016, Patent No. WO 2016/177888 Al

    Research output: PatentScientific

ID: 7000011