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A numerical simulation method for the laser-induced temperature distribution

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A numerical simulation method for the laser-induced temperature distribution. / Rantala, Tapio T.; Levoska, Juhani.

In: Journal of Applied Physics, Vol. 65, No. 12, 1989, p. 4475-4479.

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Harvard

Rantala, TT & Levoska, J 1989, 'A numerical simulation method for the laser-induced temperature distribution', Journal of Applied Physics, vol. 65, no. 12, pp. 4475-4479. https://doi.org/10.1063/1.343265

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Rantala, Tapio T. ; Levoska, Juhani. / A numerical simulation method for the laser-induced temperature distribution. In: Journal of Applied Physics. 1989 ; Vol. 65, No. 12. pp. 4475-4479.

Bibtex - Download

@article{2cf911650aff4098a472d5e559058c87,
title = "A numerical simulation method for the laser-induced temperature distribution",
abstract = "A numerical simulation approach for the evaluation of temperature distribution in a substrate during the laser processing is developed. The explicit finite-difference solution of the heat (diffusion) equation is chosen as the starting point in order to simply retain general nonlinearity, physical transparency, and flexibility of the procedure. The method is tested with a simulation of silicon substrate irradiated by cw argon laser, and the results are compared with those from experiments and exact analytical results, where available. Deficiences due to the omission of the nonlinearity, i.e., the temperature dependency of the material properties, in the results of approximative analytical approaches are discussed.",
author = "Rantala, {Tapio T.} and Juhani Levoska",
year = "1989",
doi = "10.1063/1.343265",
language = "English",
volume = "65",
pages = "4475--4479",
journal = "Journal of Applied Physics",
issn = "0021-8979",
publisher = "AMER INST PHYSICS",
number = "12",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - A numerical simulation method for the laser-induced temperature distribution

AU - Rantala, Tapio T.

AU - Levoska, Juhani

PY - 1989

Y1 - 1989

N2 - A numerical simulation approach for the evaluation of temperature distribution in a substrate during the laser processing is developed. The explicit finite-difference solution of the heat (diffusion) equation is chosen as the starting point in order to simply retain general nonlinearity, physical transparency, and flexibility of the procedure. The method is tested with a simulation of silicon substrate irradiated by cw argon laser, and the results are compared with those from experiments and exact analytical results, where available. Deficiences due to the omission of the nonlinearity, i.e., the temperature dependency of the material properties, in the results of approximative analytical approaches are discussed.

AB - A numerical simulation approach for the evaluation of temperature distribution in a substrate during the laser processing is developed. The explicit finite-difference solution of the heat (diffusion) equation is chosen as the starting point in order to simply retain general nonlinearity, physical transparency, and flexibility of the procedure. The method is tested with a simulation of silicon substrate irradiated by cw argon laser, and the results are compared with those from experiments and exact analytical results, where available. Deficiences due to the omission of the nonlinearity, i.e., the temperature dependency of the material properties, in the results of approximative analytical approaches are discussed.

U2 - 10.1063/1.343265

DO - 10.1063/1.343265

M3 - Article

VL - 65

SP - 4475

EP - 4479

JO - Journal of Applied Physics

JF - Journal of Applied Physics

SN - 0021-8979

IS - 12

ER -