Block copolymer lithography: Feature size control and extension by an over-etch technique
Research output: Contribution to journal › Article › Scientific › peer-review
|Number of pages||6|
|Journal||Thin Solid Films|
|Publication status||Published - 1 Nov 2012|
|Publication type||A1 Journal article-refereed|
Block copolymer lithography based on block copolymer (BCP) self-assembly can be used to develop soft mask nanoscale templates for subsequent pattern transfer to generate substrate features. Self-assembly of lamellar polystyrene-b-polymethylmethacrylate BCP of varying molecular weights to generate silicon nanoscale features is reported here. It has also been demonstrated that the feature size can be controlled by a plasma over-etch process and discussed.