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Directed self-assembly of high-chi block copolymer for fabrication of optical nanoresonator

Research output: Contribution to journalArticleScientificpeer-review


Original languageEnglish
Pages (from-to)18306-18314
Number of pages9
Issue number10
Publication statusPublished - 3 Sep 2018
Publication typeA1 Journal article-refereed


In this paper, we report on the fabrication of optical nanoresonators using block copolymer lithography. The nanostructured gratings or nanofins were fabricated by silicon-containing block copolymer on a chromium coated silicon-on-insulator substrate. Etch resistance of the block copolymer template enables a unique patterning technique for high-aspect-ratio silicon nanofins. Integration of the directed self-assembly with nanoimprint lithography provides a well-aligned array of nanofins with a depth of ~125 nm on a wafer scale. The developed nanopatterning method is an alternative to the previously reported nanopatterning techniques utilizing block copolymers. The dense array of sub-10 nm nanofins are used to realize a photonic guided-mode resonance filter. The nanostructured grating provides high sensitivity in refractive index sensing, as demonstrated by simulations and experiments in measuring varying contents of the tetrahydrofuran solvent.

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Field of science, Statistics Finland

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