Directed self-assembly of high-chi block copolymer for fabrication of optical nanoresonator
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Details
| Original language | English |
|---|---|
| Pages (from-to) | 18306-18314 |
| Number of pages | 9 |
| Journal | Nanoscale |
| Issue number | 10 |
| DOIs | |
| Publication status | Published - 3 Sep 2018 |
| Publication type | A1 Journal article-refereed |
Abstract
In this paper, we report on the fabrication of optical nanoresonators using block copolymer lithography. The nanostructured gratings or nanofins were fabricated by silicon-containing block copolymer on a chromium coated silicon-on-insulator substrate. Etch resistance of the block copolymer template enables a unique patterning technique for high-aspect-ratio silicon nanofins. Integration of the directed self-assembly with nanoimprint lithography provides a well-aligned array of nanofins with a depth of ~125 nm on a wafer scale. The developed nanopatterning method is an alternative to the previously reported nanopatterning techniques utilizing block copolymers. The dense array of sub-10 nm nanofins are used to realize a photonic guided-mode resonance filter. The nanostructured grating provides high sensitivity in refractive index sensing, as demonstrated by simulations and experiments in measuring varying contents of the tetrahydrofuran solvent.