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Dots-on-the-fly electron beam lithography

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Dots-on-the-fly electron beam lithography. / Isotalo, Tero J.; Niemi, Tapio.

SPIE Proceedings: Alternative Lithographic Technologies VIII. ed. / Christopher Bencher. Vol. 9777 SPIE, 2016. 97771E (Proceedings of SPIE).

Research output: Chapter in Book/Report/Conference proceedingConference contributionScientificpeer-review

Harvard

Isotalo, TJ & Niemi, T 2016, Dots-on-the-fly electron beam lithography. in C Bencher (ed.), SPIE Proceedings: Alternative Lithographic Technologies VIII. vol. 9777, 97771E, Proceedings of SPIE, SPIE, Alternative Lithographic Technologies, 1/01/00. https://doi.org/10.1117/12.2219136

APA

Isotalo, T. J., & Niemi, T. (2016). Dots-on-the-fly electron beam lithography. In C. Bencher (Ed.), SPIE Proceedings: Alternative Lithographic Technologies VIII (Vol. 9777). [97771E] (Proceedings of SPIE). SPIE. https://doi.org/10.1117/12.2219136

Vancouver

Isotalo TJ, Niemi T. Dots-on-the-fly electron beam lithography. In Bencher C, editor, SPIE Proceedings: Alternative Lithographic Technologies VIII. Vol. 9777. SPIE. 2016. 97771E. (Proceedings of SPIE). https://doi.org/10.1117/12.2219136

Author

Isotalo, Tero J. ; Niemi, Tapio. / Dots-on-the-fly electron beam lithography. SPIE Proceedings: Alternative Lithographic Technologies VIII. editor / Christopher Bencher. Vol. 9777 SPIE, 2016. (Proceedings of SPIE).

Bibtex - Download

@inproceedings{62c206fadbab4fc486a4c07d12bf3e1c,
title = "Dots-on-the-fly electron beam lithography",
abstract = "We demonstrate a novel approach for electron-beam lithography (EBL) of periodic nanostructures. This technique can rapidly produce arrays of various metallic and etched nanostructures with line and pitch dimensions approaching the beam spot size. Our approach is based on often neglected functionality which is inherent in most modern EBL systems. The raster/vector beam exposure system of the EBL software is exploited to produce arrays of pixel-like spots without the need to define coordinates for each spot in the array. Producing large arrays with traditional EBL techniques is cumbersome during pattern design, usually leads to large data files and easily results in system memory overload during patterning. In Dots-on-The-fly (DOTF) patterning, instead of specifying the locations of individual spots, a boundary for the array is given and the spacing between spots within the boundary is specified by the beam step size. A designed pattern element thus becomes a container object, with beam spacing acting as a parameterized location list for an array of spots confined by that container. With the DOTF method, a single pattern element, such as a square, rectangle or circle, can be used to produce a large array containing thousands of spots. In addition to simple arrays of nano-dots, we expand the technique to produce more complex, highly tunable arrays and structures on substrates of silicon, ITO/ FTO coated glass, as well as uncoated fused silica, quartz and sapphire.",
keywords = "electron beam lithography, nano-fabrication, nano-particle arrays, optoelectronics, periodic nano-structures, plasmonics",
author = "Isotalo, {Tero J.} and Tapio Niemi",
year = "2016",
doi = "10.1117/12.2219136",
language = "English",
volume = "9777",
series = "Proceedings of SPIE",
publisher = "SPIE",
editor = "Christopher Bencher",
booktitle = "SPIE Proceedings",
address = "United States",

}

RIS (suitable for import to EndNote) - Download

TY - GEN

T1 - Dots-on-the-fly electron beam lithography

AU - Isotalo, Tero J.

AU - Niemi, Tapio

PY - 2016

Y1 - 2016

N2 - We demonstrate a novel approach for electron-beam lithography (EBL) of periodic nanostructures. This technique can rapidly produce arrays of various metallic and etched nanostructures with line and pitch dimensions approaching the beam spot size. Our approach is based on often neglected functionality which is inherent in most modern EBL systems. The raster/vector beam exposure system of the EBL software is exploited to produce arrays of pixel-like spots without the need to define coordinates for each spot in the array. Producing large arrays with traditional EBL techniques is cumbersome during pattern design, usually leads to large data files and easily results in system memory overload during patterning. In Dots-on-The-fly (DOTF) patterning, instead of specifying the locations of individual spots, a boundary for the array is given and the spacing between spots within the boundary is specified by the beam step size. A designed pattern element thus becomes a container object, with beam spacing acting as a parameterized location list for an array of spots confined by that container. With the DOTF method, a single pattern element, such as a square, rectangle or circle, can be used to produce a large array containing thousands of spots. In addition to simple arrays of nano-dots, we expand the technique to produce more complex, highly tunable arrays and structures on substrates of silicon, ITO/ FTO coated glass, as well as uncoated fused silica, quartz and sapphire.

AB - We demonstrate a novel approach for electron-beam lithography (EBL) of periodic nanostructures. This technique can rapidly produce arrays of various metallic and etched nanostructures with line and pitch dimensions approaching the beam spot size. Our approach is based on often neglected functionality which is inherent in most modern EBL systems. The raster/vector beam exposure system of the EBL software is exploited to produce arrays of pixel-like spots without the need to define coordinates for each spot in the array. Producing large arrays with traditional EBL techniques is cumbersome during pattern design, usually leads to large data files and easily results in system memory overload during patterning. In Dots-on-The-fly (DOTF) patterning, instead of specifying the locations of individual spots, a boundary for the array is given and the spacing between spots within the boundary is specified by the beam step size. A designed pattern element thus becomes a container object, with beam spacing acting as a parameterized location list for an array of spots confined by that container. With the DOTF method, a single pattern element, such as a square, rectangle or circle, can be used to produce a large array containing thousands of spots. In addition to simple arrays of nano-dots, we expand the technique to produce more complex, highly tunable arrays and structures on substrates of silicon, ITO/ FTO coated glass, as well as uncoated fused silica, quartz and sapphire.

KW - electron beam lithography

KW - nano-fabrication

KW - nano-particle arrays

KW - optoelectronics

KW - periodic nano-structures

KW - plasmonics

U2 - 10.1117/12.2219136

DO - 10.1117/12.2219136

M3 - Conference contribution

VL - 9777

T3 - Proceedings of SPIE

BT - SPIE Proceedings

A2 - Bencher, Christopher

PB - SPIE

ER -