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High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures

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High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures. / Rasappa, Sozaraj; Hulkkonen, Hanna; Schulte, Lars; Ndoni, Sokol; Reuna, Jarno; Salminen, Turkka; Niemi, Tapio.

In: Journal of Colloid and Interface Science, Vol. 534, No. 15, 2019, p. 420-429.

Research output: Contribution to journalArticleScientificpeer-review

Harvard

Rasappa, S, Hulkkonen, H, Schulte, L, Ndoni, S, Reuna, J, Salminen, T & Niemi, T 2019, 'High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures' Journal of Colloid and Interface Science, vol. 534, no. 15, pp. 420-429.

APA

Vancouver

Rasappa S, Hulkkonen H, Schulte L, Ndoni S, Reuna J, Salminen T et al. High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures. Journal of Colloid and Interface Science. 2019;534(15):420-429.

Author

Rasappa, Sozaraj ; Hulkkonen, Hanna ; Schulte, Lars ; Ndoni, Sokol ; Reuna, Jarno ; Salminen, Turkka ; Niemi, Tapio. / High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures. In: Journal of Colloid and Interface Science. 2019 ; Vol. 534, No. 15. pp. 420-429.

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@article{00593fbc19ef4abeb953dbc275d4c901,
title = "High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures",
abstract = "An unusual dot pattern was realized via self-assembly of high molecular weight polystyrene-block-polydimethylsiloxane (PS-b-PDMS) copolymer by a simple one-step solvent annealing process, optimized based on Hansen solubility parameters. Annealing PS-b-PDMS under neutral solvent vapors at room temperature produces an ordered arrangement of dots with ∼112 nm spacing and ∼54 nm diameter. The template is highly resistant to dry etching with chlorine-based plasma, enabling its utilization on a variety of hard masks and substrates. The self-assembled PDMS dots were further exploited as a template for direct patterning of silicon, metal, and dielectric materials. This nanopatterning methodology circumvents expensive and time-consuming atomic layer deposition, wet processes, and sequential infiltration techniques. Application-wise, we show a process to fabricate nanostructured antireflection surfaces (nanocones) on a 2 in. silicon wafer, reducing the reflectance of planar silicon from 35{\%} to below 0.5{\%} over a broad wavelength range. Alternatively, nanocones made of TiO2 on silicon exhibit low reflectance (<3{\%}) and improved transmittance into the substrate at the visible wavelength range. The measured optical properties concur with the simulation results. The versatility of the PS-b-PDMS templates was further utilized for nanopatterning materials such as silicon-on-insulator substrates, gallium arsenide, aluminum indium phosphide, and gallium nitride, which are important in electronics and photonics.",
author = "Sozaraj Rasappa and Hanna Hulkkonen and Lars Schulte and Sokol Ndoni and Jarno Reuna and Turkka Salminen and Tapio Niemi",
year = "2019",
language = "English",
volume = "534",
pages = "420--429",
journal = "Journal of Colloid and Interface Science",
issn = "0021-9797",
publisher = "Elsevier",
number = "15",

}

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TY - JOUR

T1 - High molecular weight block copolymer lithography for nanofabrication of hard mask and photonic nanostructures

AU - Rasappa, Sozaraj

AU - Hulkkonen, Hanna

AU - Schulte, Lars

AU - Ndoni, Sokol

AU - Reuna, Jarno

AU - Salminen, Turkka

AU - Niemi, Tapio

PY - 2019

Y1 - 2019

N2 - An unusual dot pattern was realized via self-assembly of high molecular weight polystyrene-block-polydimethylsiloxane (PS-b-PDMS) copolymer by a simple one-step solvent annealing process, optimized based on Hansen solubility parameters. Annealing PS-b-PDMS under neutral solvent vapors at room temperature produces an ordered arrangement of dots with ∼112 nm spacing and ∼54 nm diameter. The template is highly resistant to dry etching with chlorine-based plasma, enabling its utilization on a variety of hard masks and substrates. The self-assembled PDMS dots were further exploited as a template for direct patterning of silicon, metal, and dielectric materials. This nanopatterning methodology circumvents expensive and time-consuming atomic layer deposition, wet processes, and sequential infiltration techniques. Application-wise, we show a process to fabricate nanostructured antireflection surfaces (nanocones) on a 2 in. silicon wafer, reducing the reflectance of planar silicon from 35% to below 0.5% over a broad wavelength range. Alternatively, nanocones made of TiO2 on silicon exhibit low reflectance (<3%) and improved transmittance into the substrate at the visible wavelength range. The measured optical properties concur with the simulation results. The versatility of the PS-b-PDMS templates was further utilized for nanopatterning materials such as silicon-on-insulator substrates, gallium arsenide, aluminum indium phosphide, and gallium nitride, which are important in electronics and photonics.

AB - An unusual dot pattern was realized via self-assembly of high molecular weight polystyrene-block-polydimethylsiloxane (PS-b-PDMS) copolymer by a simple one-step solvent annealing process, optimized based on Hansen solubility parameters. Annealing PS-b-PDMS under neutral solvent vapors at room temperature produces an ordered arrangement of dots with ∼112 nm spacing and ∼54 nm diameter. The template is highly resistant to dry etching with chlorine-based plasma, enabling its utilization on a variety of hard masks and substrates. The self-assembled PDMS dots were further exploited as a template for direct patterning of silicon, metal, and dielectric materials. This nanopatterning methodology circumvents expensive and time-consuming atomic layer deposition, wet processes, and sequential infiltration techniques. Application-wise, we show a process to fabricate nanostructured antireflection surfaces (nanocones) on a 2 in. silicon wafer, reducing the reflectance of planar silicon from 35% to below 0.5% over a broad wavelength range. Alternatively, nanocones made of TiO2 on silicon exhibit low reflectance (<3%) and improved transmittance into the substrate at the visible wavelength range. The measured optical properties concur with the simulation results. The versatility of the PS-b-PDMS templates was further utilized for nanopatterning materials such as silicon-on-insulator substrates, gallium arsenide, aluminum indium phosphide, and gallium nitride, which are important in electronics and photonics.

M3 - Article

VL - 534

SP - 420

EP - 429

JO - Journal of Colloid and Interface Science

JF - Journal of Colloid and Interface Science

SN - 0021-9797

IS - 15

ER -