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Molecularly functionalized silicon substrates for orientation control of the microphase separation of PS-b-PMMA and PS-b-PDMS block copolymer systems

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Molecularly functionalized silicon substrates for orientation control of the microphase separation of PS-b-PMMA and PS-b-PDMS block copolymer systems. / Borah, Dipu; Ozmen, Mustafa; Rasappa, Sozaraj; Shaw, Matthew T.; Holmes, Justin D.; Morris, Michael A.

In: Langmuir, Vol. 29, No. 9, 05.03.2013, p. 2809-2820.

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Borah, Dipu ; Ozmen, Mustafa ; Rasappa, Sozaraj ; Shaw, Matthew T. ; Holmes, Justin D. ; Morris, Michael A. / Molecularly functionalized silicon substrates for orientation control of the microphase separation of PS-b-PMMA and PS-b-PDMS block copolymer systems. In: Langmuir. 2013 ; Vol. 29, No. 9. pp. 2809-2820.

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@article{cca24d350a1b4180a5003d10b07dea2c,
title = "Molecularly functionalized silicon substrates for orientation control of the microphase separation of PS-b-PMMA and PS-b-PDMS block copolymer systems",
abstract = "The use of block copolymer (BCP) thin films to generate nanostructured surfaces for device and other applications requires precise control of interfacial energies to achieve the desired domain orientation. Usually, the surface chemistry is engineered through the use of homo- or random copolymer brushes grown or attached to the surface. Herein, we demonstrate a facile, rapid, and tunable approach to surface functionalization using a molecular approach based on ethylene glycol attachment to the surface. The effectiveness of the molecular approach is demonstrated for the microphase separation of PS-b-PMMA and PS-b-PDMS BCPs in thin films and the development of nanoscale features at the substrate.",
author = "Dipu Borah and Mustafa Ozmen and Sozaraj Rasappa and Shaw, {Matthew T.} and Holmes, {Justin D.} and Morris, {Michael A.}",
year = "2013",
month = "3",
day = "5",
doi = "10.1021/la304140q",
language = "English",
volume = "29",
pages = "2809--2820",
journal = "Langmuir",
issn = "0743-7463",
publisher = "AMER CHEMICAL SOC",
number = "9",

}

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TY - JOUR

T1 - Molecularly functionalized silicon substrates for orientation control of the microphase separation of PS-b-PMMA and PS-b-PDMS block copolymer systems

AU - Borah, Dipu

AU - Ozmen, Mustafa

AU - Rasappa, Sozaraj

AU - Shaw, Matthew T.

AU - Holmes, Justin D.

AU - Morris, Michael A.

PY - 2013/3/5

Y1 - 2013/3/5

N2 - The use of block copolymer (BCP) thin films to generate nanostructured surfaces for device and other applications requires precise control of interfacial energies to achieve the desired domain orientation. Usually, the surface chemistry is engineered through the use of homo- or random copolymer brushes grown or attached to the surface. Herein, we demonstrate a facile, rapid, and tunable approach to surface functionalization using a molecular approach based on ethylene glycol attachment to the surface. The effectiveness of the molecular approach is demonstrated for the microphase separation of PS-b-PMMA and PS-b-PDMS BCPs in thin films and the development of nanoscale features at the substrate.

AB - The use of block copolymer (BCP) thin films to generate nanostructured surfaces for device and other applications requires precise control of interfacial energies to achieve the desired domain orientation. Usually, the surface chemistry is engineered through the use of homo- or random copolymer brushes grown or attached to the surface. Herein, we demonstrate a facile, rapid, and tunable approach to surface functionalization using a molecular approach based on ethylene glycol attachment to the surface. The effectiveness of the molecular approach is demonstrated for the microphase separation of PS-b-PMMA and PS-b-PDMS BCPs in thin films and the development of nanoscale features at the substrate.

UR - http://www.scopus.com/inward/record.url?scp=84874584704&partnerID=8YFLogxK

U2 - 10.1021/la304140q

DO - 10.1021/la304140q

M3 - Article

VL - 29

SP - 2809

EP - 2820

JO - Langmuir

JF - Langmuir

SN - 0743-7463

IS - 9

ER -