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Narrow-linewidth 780 nm DFB lasers fabricated using nanoimprint lithography

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Narrow-linewidth 780 nm DFB lasers fabricated using nanoimprint lithography. / Virtanen, Heikki; Uusitalo, Topi; Karjalainen, Maija; Ranta, Sanna; Viheriala, Jukka; Dumitrescu, Mihail.

In: IEEE Photonics Technology Letters, Vol. 30, No. 1, 2018, p. 51-54.

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Virtanen, Heikki ; Uusitalo, Topi ; Karjalainen, Maija ; Ranta, Sanna ; Viheriala, Jukka ; Dumitrescu, Mihail. / Narrow-linewidth 780 nm DFB lasers fabricated using nanoimprint lithography. In: IEEE Photonics Technology Letters. 2018 ; Vol. 30, No. 1. pp. 51-54.

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@article{d8a07dc89e534446a38e3b2f81d308b3,
title = "Narrow-linewidth 780 nm DFB lasers fabricated using nanoimprint lithography",
abstract = "The paper presents narrow-linewidth 780 nm edgeemitting semiconductor DFB lasers fabricated without regrowth using UV-nanoimprinted surface gratings. The thirdorder laterally-coupled ridge-waveguide surface gratings enable single mode operation, excellent spectral purity (40-55 dB side mode suppression ratio and 10 kHz linewidth) and good lightcurrent- voltage characteristics in continuous wave operation (~112 mA threshold current, ~1.55 V opening voltage and 28.9 mW output power from one facet at 300 mA current for 2.4 mm long devices), which are vital in various applications, such as rubidium spectroscopy and atomic clock pumping. The low fabrication costs, high throughput, structural flexibility and high device yield make the fabrication method fully compatible with large scale mass production, enabling the fabrication of low-cost miniaturized modules.",
keywords = "DFB laser, Gratings, Laser modes, Measurement by laser beam, narrow linewidth, Optical device fabrication, Optical interferometry, Surface emitting lasers, surface gratings, UV-nanoimprint lithography",
author = "Heikki Virtanen and Topi Uusitalo and Maija Karjalainen and Sanna Ranta and Jukka Viheriala and Mihail Dumitrescu",
year = "2018",
doi = "10.1109/LPT.2017.2772337",
language = "English",
volume = "30",
pages = "51--54",
journal = "IEEE Photonics Technology Letters",
issn = "1041-1135",
publisher = "Institute of Electrical and Electronics Engineers",
number = "1",

}

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TY - JOUR

T1 - Narrow-linewidth 780 nm DFB lasers fabricated using nanoimprint lithography

AU - Virtanen, Heikki

AU - Uusitalo, Topi

AU - Karjalainen, Maija

AU - Ranta, Sanna

AU - Viheriala, Jukka

AU - Dumitrescu, Mihail

PY - 2018

Y1 - 2018

N2 - The paper presents narrow-linewidth 780 nm edgeemitting semiconductor DFB lasers fabricated without regrowth using UV-nanoimprinted surface gratings. The thirdorder laterally-coupled ridge-waveguide surface gratings enable single mode operation, excellent spectral purity (40-55 dB side mode suppression ratio and 10 kHz linewidth) and good lightcurrent- voltage characteristics in continuous wave operation (~112 mA threshold current, ~1.55 V opening voltage and 28.9 mW output power from one facet at 300 mA current for 2.4 mm long devices), which are vital in various applications, such as rubidium spectroscopy and atomic clock pumping. The low fabrication costs, high throughput, structural flexibility and high device yield make the fabrication method fully compatible with large scale mass production, enabling the fabrication of low-cost miniaturized modules.

AB - The paper presents narrow-linewidth 780 nm edgeemitting semiconductor DFB lasers fabricated without regrowth using UV-nanoimprinted surface gratings. The thirdorder laterally-coupled ridge-waveguide surface gratings enable single mode operation, excellent spectral purity (40-55 dB side mode suppression ratio and 10 kHz linewidth) and good lightcurrent- voltage characteristics in continuous wave operation (~112 mA threshold current, ~1.55 V opening voltage and 28.9 mW output power from one facet at 300 mA current for 2.4 mm long devices), which are vital in various applications, such as rubidium spectroscopy and atomic clock pumping. The low fabrication costs, high throughput, structural flexibility and high device yield make the fabrication method fully compatible with large scale mass production, enabling the fabrication of low-cost miniaturized modules.

KW - DFB laser

KW - Gratings

KW - Laser modes

KW - Measurement by laser beam

KW - narrow linewidth

KW - Optical device fabrication

KW - Optical interferometry

KW - Surface emitting lasers

KW - surface gratings

KW - UV-nanoimprint lithography

U2 - 10.1109/LPT.2017.2772337

DO - 10.1109/LPT.2017.2772337

M3 - Article

VL - 30

SP - 51

EP - 54

JO - IEEE Photonics Technology Letters

JF - IEEE Photonics Technology Letters

SN - 1041-1135

IS - 1

ER -