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Novel method for chemical vapor deposition and atomic layer epitaxy using radical chemistry

Research output: Contribution to journalArticleScientificpeer-review

Details

Original languageEnglish
Pages (from-to)212-218
JournalThin Solid Films
Volume225
Issue number1-2
DOIs
Publication statusPublished - 1993
Externally publishedYes
Publication typeA1 Journal article-refereed

Publication forum classification