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Optical interference lithography using azobenzene-functionalized polymers for micro-and nanopatterning of silicon

Research output: Contribution to journalArticleScientificpeer-review

Details

Original languageEnglish
Pages (from-to)4174-4177
Number of pages4
JournalAdvanced Materials
Volume23
Issue number36
DOIs
Publication statusPublished - 22 Sep 2011
Publication typeA1 Journal article-refereed

Abstract

Light-induced mass transport in azobenzene-functionalized polymers is exploited in optical interference lithography to fabricate large-area, periodic 1D and 2D silicon nanostructures. The demonstrated technique is a fast, reliable, and cost-effective alternative to conventional photoresist-based methods of nano-and microfabrication. Potential applications of the technique range from optics and photonics to functional materials and coatings.

Keywords

  • azobenzene, lithography, nanopatterning, surface-relief grating