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Orientation and alignment control of microphase-separated PS-b-PDMS substrate patterns via polymer brush chemistry

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Orientation and alignment control of microphase-separated PS-b-PDMS substrate patterns via polymer brush chemistry. / Borah, Dipu; Rasappa, Sozaraj; Senthamaraikannan, Ramsankar; Kosmala, Barbara; Shaw, Matthew T.; Holmes, Justin D.; Morris, Michael A.

In: ACS Applied Materials and Interfaces, Vol. 5, No. 1, 09.01.2013, p. 88-97.

Research output: Contribution to journalArticleScientificpeer-review

Harvard

Borah, D, Rasappa, S, Senthamaraikannan, R, Kosmala, B, Shaw, MT, Holmes, JD & Morris, MA 2013, 'Orientation and alignment control of microphase-separated PS-b-PDMS substrate patterns via polymer brush chemistry', ACS Applied Materials and Interfaces, vol. 5, no. 1, pp. 88-97. https://doi.org/10.1021/am302150z

APA

Borah, D., Rasappa, S., Senthamaraikannan, R., Kosmala, B., Shaw, M. T., Holmes, J. D., & Morris, M. A. (2013). Orientation and alignment control of microphase-separated PS-b-PDMS substrate patterns via polymer brush chemistry. ACS Applied Materials and Interfaces, 5(1), 88-97. https://doi.org/10.1021/am302150z

Vancouver

Borah D, Rasappa S, Senthamaraikannan R, Kosmala B, Shaw MT, Holmes JD et al. Orientation and alignment control of microphase-separated PS-b-PDMS substrate patterns via polymer brush chemistry. ACS Applied Materials and Interfaces. 2013 Jan 9;5(1):88-97. https://doi.org/10.1021/am302150z

Author

Borah, Dipu ; Rasappa, Sozaraj ; Senthamaraikannan, Ramsankar ; Kosmala, Barbara ; Shaw, Matthew T. ; Holmes, Justin D. ; Morris, Michael A. / Orientation and alignment control of microphase-separated PS-b-PDMS substrate patterns via polymer brush chemistry. In: ACS Applied Materials and Interfaces. 2013 ; Vol. 5, No. 1. pp. 88-97.

Bibtex - Download

@article{6f600566a5af4b0aaf20a24ff794f69f,
title = "Orientation and alignment control of microphase-separated PS-b-PDMS substrate patterns via polymer brush chemistry",
abstract = "Block copolymer (BCP) microphase separation at substrate surfaces might enable the generation of substrate features in a scalable, bottom-up fashion, provided that the pattern structure, orientation, and alignment can be strictly controlled. The PS-b-PDMS (polystyrene-b-polydimethylsiloxane) system is attractive because it can form small features and the two blocks can be readily differentiated during pattern transfer. However, PS-b-PDMS offers a considerable challenge, because of the chemical differences in the blocks, which leads to poor surface wetting, poor pattern orientation control, and structural instabilities. These challenges are considerably greater when line patterns must be created, and this is the focus of the current work. Here, we report controlled pattern formation in cylinder-forming PS-b-PDMS by anchoring different types of hydroxyl-terminated homopolymer and random copolymer brushes on planar and topographically patterned silicon substrates for the fabrication of nanoscale templates. It is demonstrated that non-PDMS-OH-containing brushes may be used, which offers an advantage for substrate feature formation. To demonstrate the three-dimensional (3-D) film structure and show the potential of this system toward applications such as structure generation, the PDMS patterns were transferred to the underlying substrate to fabricate nanoscale features with a feature size of ∼14 nm.",
keywords = "etching, graphoepitaxy, nanoscale templates, polymer brushes, PS-b-PDMS, self-assembly, solvent anneal",
author = "Dipu Borah and Sozaraj Rasappa and Ramsankar Senthamaraikannan and Barbara Kosmala and Shaw, {Matthew T.} and Holmes, {Justin D.} and Morris, {Michael A.}",
year = "2013",
month = "1",
day = "9",
doi = "10.1021/am302150z",
language = "English",
volume = "5",
pages = "88--97",
journal = "ACS Applied Materials & Interfaces",
issn = "1944-8244",
publisher = "American Chemical Society ACS",
number = "1",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Orientation and alignment control of microphase-separated PS-b-PDMS substrate patterns via polymer brush chemistry

AU - Borah, Dipu

AU - Rasappa, Sozaraj

AU - Senthamaraikannan, Ramsankar

AU - Kosmala, Barbara

AU - Shaw, Matthew T.

AU - Holmes, Justin D.

AU - Morris, Michael A.

PY - 2013/1/9

Y1 - 2013/1/9

N2 - Block copolymer (BCP) microphase separation at substrate surfaces might enable the generation of substrate features in a scalable, bottom-up fashion, provided that the pattern structure, orientation, and alignment can be strictly controlled. The PS-b-PDMS (polystyrene-b-polydimethylsiloxane) system is attractive because it can form small features and the two blocks can be readily differentiated during pattern transfer. However, PS-b-PDMS offers a considerable challenge, because of the chemical differences in the blocks, which leads to poor surface wetting, poor pattern orientation control, and structural instabilities. These challenges are considerably greater when line patterns must be created, and this is the focus of the current work. Here, we report controlled pattern formation in cylinder-forming PS-b-PDMS by anchoring different types of hydroxyl-terminated homopolymer and random copolymer brushes on planar and topographically patterned silicon substrates for the fabrication of nanoscale templates. It is demonstrated that non-PDMS-OH-containing brushes may be used, which offers an advantage for substrate feature formation. To demonstrate the three-dimensional (3-D) film structure and show the potential of this system toward applications such as structure generation, the PDMS patterns were transferred to the underlying substrate to fabricate nanoscale features with a feature size of ∼14 nm.

AB - Block copolymer (BCP) microphase separation at substrate surfaces might enable the generation of substrate features in a scalable, bottom-up fashion, provided that the pattern structure, orientation, and alignment can be strictly controlled. The PS-b-PDMS (polystyrene-b-polydimethylsiloxane) system is attractive because it can form small features and the two blocks can be readily differentiated during pattern transfer. However, PS-b-PDMS offers a considerable challenge, because of the chemical differences in the blocks, which leads to poor surface wetting, poor pattern orientation control, and structural instabilities. These challenges are considerably greater when line patterns must be created, and this is the focus of the current work. Here, we report controlled pattern formation in cylinder-forming PS-b-PDMS by anchoring different types of hydroxyl-terminated homopolymer and random copolymer brushes on planar and topographically patterned silicon substrates for the fabrication of nanoscale templates. It is demonstrated that non-PDMS-OH-containing brushes may be used, which offers an advantage for substrate feature formation. To demonstrate the three-dimensional (3-D) film structure and show the potential of this system toward applications such as structure generation, the PDMS patterns were transferred to the underlying substrate to fabricate nanoscale features with a feature size of ∼14 nm.

KW - etching

KW - graphoepitaxy

KW - nanoscale templates

KW - polymer brushes

KW - PS-b-PDMS

KW - self-assembly

KW - solvent anneal

UR - http://www.scopus.com/inward/record.url?scp=84872137889&partnerID=8YFLogxK

U2 - 10.1021/am302150z

DO - 10.1021/am302150z

M3 - Article

VL - 5

SP - 88

EP - 97

JO - ACS Applied Materials & Interfaces

JF - ACS Applied Materials & Interfaces

SN - 1944-8244

IS - 1

ER -