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Rapid, Brushless Self-assembly of a PS-b-PDMS Block Copolymer for Nanolithography

Research output: Contribution to journalArticleScientificpeer-review

Details

Original languageEnglish
Pages (from-to)1-5
Number of pages5
JournalColloids and Interface Science Communications
Volume2
DOIs
Publication statusPublished - 1 Oct 2014
Publication typeA1 Journal article-refereed

Abstract

Block copolymers (BCP) are highly promising self-assembling precursors for scalable nanolithography. Very regular BCP nanopatterns can be used as on-chip etch masks. The first step in the processing of BCP thin films is usually the chemical modification of the substrate surface, typically by grafting of a brush layer that renders the surface energy neutral relative to the constituent blocks. We provide here a first study on rapid, low temperature self-assembly of PS-. b-PDMS (polystyrene-. block-polydimethylsiloxane) on silicon substrates without a brush layer. We show that it forms line and antidot patterns after short solvo-thermal annealing. Unlike previous reports on this system, low temperature and short annealing time provide self-assembly in homogeneous thin films covering large substrate areas. This on-chip mask was then used for pattern transfer to the underlying silicon substrate. SEM (scanning electron microscope) images reveal silicon nanowires relative to the PDMS patterns of the BCP mask.

Keywords

  • Aspect ratio, Brushless, Dry etching, Lines and antidots, Pattern transfer, PS-b-PDMS, Self-assembly, Silicon nanostructures, Soft mask template, Solvo-thermal annealing