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Rapid, Brushless Self-assembly of a PS-b-PDMS Block Copolymer for Nanolithography

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Rapid, Brushless Self-assembly of a PS-b-PDMS Block Copolymer for Nanolithography. / Rasappa, Sozaraj; Schulte, Lars; Borah, Dipu; Morris, Michael A.; Ndoni, Sokol.

In: Colloids and Interface Science Communications, Vol. 2, 01.10.2014, p. 1-5.

Research output: Contribution to journalArticleScientificpeer-review

Harvard

Rasappa, S, Schulte, L, Borah, D, Morris, MA & Ndoni, S 2014, 'Rapid, Brushless Self-assembly of a PS-b-PDMS Block Copolymer for Nanolithography', Colloids and Interface Science Communications, vol. 2, pp. 1-5. https://doi.org/10.1016/j.colcom.2014.07.001

APA

Rasappa, S., Schulte, L., Borah, D., Morris, M. A., & Ndoni, S. (2014). Rapid, Brushless Self-assembly of a PS-b-PDMS Block Copolymer for Nanolithography. Colloids and Interface Science Communications, 2, 1-5. https://doi.org/10.1016/j.colcom.2014.07.001

Vancouver

Rasappa S, Schulte L, Borah D, Morris MA, Ndoni S. Rapid, Brushless Self-assembly of a PS-b-PDMS Block Copolymer for Nanolithography. Colloids and Interface Science Communications. 2014 Oct 1;2:1-5. https://doi.org/10.1016/j.colcom.2014.07.001

Author

Rasappa, Sozaraj ; Schulte, Lars ; Borah, Dipu ; Morris, Michael A. ; Ndoni, Sokol. / Rapid, Brushless Self-assembly of a PS-b-PDMS Block Copolymer for Nanolithography. In: Colloids and Interface Science Communications. 2014 ; Vol. 2. pp. 1-5.

Bibtex - Download

@article{c98ceb7ede594fb895fb18af0fe5d6c0,
title = "Rapid, Brushless Self-assembly of a PS-b-PDMS Block Copolymer for Nanolithography",
abstract = "Block copolymers (BCP) are highly promising self-assembling precursors for scalable nanolithography. Very regular BCP nanopatterns can be used as on-chip etch masks. The first step in the processing of BCP thin films is usually the chemical modification of the substrate surface, typically by grafting of a brush layer that renders the surface energy neutral relative to the constituent blocks. We provide here a first study on rapid, low temperature self-assembly of PS-. b-PDMS (polystyrene-. block-polydimethylsiloxane) on silicon substrates without a brush layer. We show that it forms line and antidot patterns after short solvo-thermal annealing. Unlike previous reports on this system, low temperature and short annealing time provide self-assembly in homogeneous thin films covering large substrate areas. This on-chip mask was then used for pattern transfer to the underlying silicon substrate. SEM (scanning electron microscope) images reveal silicon nanowires relative to the PDMS patterns of the BCP mask.",
keywords = "Aspect ratio, Brushless, Dry etching, Lines and antidots, Pattern transfer, PS-b-PDMS, Self-assembly, Silicon nanostructures, Soft mask template, Solvo-thermal annealing",
author = "Sozaraj Rasappa and Lars Schulte and Dipu Borah and Morris, {Michael A.} and Sokol Ndoni",
year = "2014",
month = "10",
day = "1",
doi = "10.1016/j.colcom.2014.07.001",
language = "English",
volume = "2",
pages = "1--5",
journal = "Colloids and Interface Science Communications",
issn = "2215-0382",
publisher = "Elsevier BV",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Rapid, Brushless Self-assembly of a PS-b-PDMS Block Copolymer for Nanolithography

AU - Rasappa, Sozaraj

AU - Schulte, Lars

AU - Borah, Dipu

AU - Morris, Michael A.

AU - Ndoni, Sokol

PY - 2014/10/1

Y1 - 2014/10/1

N2 - Block copolymers (BCP) are highly promising self-assembling precursors for scalable nanolithography. Very regular BCP nanopatterns can be used as on-chip etch masks. The first step in the processing of BCP thin films is usually the chemical modification of the substrate surface, typically by grafting of a brush layer that renders the surface energy neutral relative to the constituent blocks. We provide here a first study on rapid, low temperature self-assembly of PS-. b-PDMS (polystyrene-. block-polydimethylsiloxane) on silicon substrates without a brush layer. We show that it forms line and antidot patterns after short solvo-thermal annealing. Unlike previous reports on this system, low temperature and short annealing time provide self-assembly in homogeneous thin films covering large substrate areas. This on-chip mask was then used for pattern transfer to the underlying silicon substrate. SEM (scanning electron microscope) images reveal silicon nanowires relative to the PDMS patterns of the BCP mask.

AB - Block copolymers (BCP) are highly promising self-assembling precursors for scalable nanolithography. Very regular BCP nanopatterns can be used as on-chip etch masks. The first step in the processing of BCP thin films is usually the chemical modification of the substrate surface, typically by grafting of a brush layer that renders the surface energy neutral relative to the constituent blocks. We provide here a first study on rapid, low temperature self-assembly of PS-. b-PDMS (polystyrene-. block-polydimethylsiloxane) on silicon substrates without a brush layer. We show that it forms line and antidot patterns after short solvo-thermal annealing. Unlike previous reports on this system, low temperature and short annealing time provide self-assembly in homogeneous thin films covering large substrate areas. This on-chip mask was then used for pattern transfer to the underlying silicon substrate. SEM (scanning electron microscope) images reveal silicon nanowires relative to the PDMS patterns of the BCP mask.

KW - Aspect ratio

KW - Brushless

KW - Dry etching

KW - Lines and antidots

KW - Pattern transfer

KW - PS-b-PDMS

KW - Self-assembly

KW - Silicon nanostructures

KW - Soft mask template

KW - Solvo-thermal annealing

UR - http://www.scopus.com/inward/record.url?scp=84919650698&partnerID=8YFLogxK

U2 - 10.1016/j.colcom.2014.07.001

DO - 10.1016/j.colcom.2014.07.001

M3 - Article

VL - 2

SP - 1

EP - 5

JO - Colloids and Interface Science Communications

JF - Colloids and Interface Science Communications

SN - 2215-0382

ER -