Reactive Magnetron Sputtering of Zirconium Carbide Films Using Ar/CH4 Gas Mixtures
Research output: Contribution to journal › Article › Scientific › peer-review
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Reactive Magnetron Sputtering of Zirconium Carbide Films Using Ar/CH4 Gas Mixtures. / Bruckner, J.; Mäntylä, T.
In: Surface and Coatings Technology, Vol. 59, 1993, p. 166-170.Research output: Contribution to journal › Article › Scientific › peer-review
Harvard
Bruckner, J & Mäntylä, T 1993, 'Reactive Magnetron Sputtering of Zirconium Carbide Films Using Ar/CH4 Gas Mixtures', Surface and Coatings Technology, vol. 59, pp. 166-170.
APA
Bruckner, J., & Mäntylä, T. (1993). Reactive Magnetron Sputtering of Zirconium Carbide Films Using Ar/CH4 Gas Mixtures. Surface and Coatings Technology, 59, 166-170.
Vancouver
Bruckner J, Mäntylä T. Reactive Magnetron Sputtering of Zirconium Carbide Films Using Ar/CH4 Gas Mixtures. Surface and Coatings Technology. 1993;59:166-170.
Author
Bibtex - Download
@article{1e08ce1f7fec481a9bd542e4522e0d57,
title = "Reactive Magnetron Sputtering of Zirconium Carbide Films Using Ar/CH4 Gas Mixtures",
author = "J. Bruckner and T. M{\"a}ntyl{\"a}",
note = "Contribution: organisation=mol,FACT1=1",
year = "1993",
language = "English",
volume = "59",
pages = "166--170",
journal = "Surface & Coatings Technology",
issn = "0257-8972",
publisher = "Elsevier",
}
RIS (suitable for import to EndNote) - Download
TY - JOUR
T1 - Reactive Magnetron Sputtering of Zirconium Carbide Films Using Ar/CH4 Gas Mixtures
AU - Bruckner, J.
AU - Mäntylä, T.
N1 - Contribution: organisation=mol,FACT1=1
PY - 1993
Y1 - 1993
M3 - Article
VL - 59
SP - 166
EP - 170
JO - Surface & Coatings Technology
JF - Surface & Coatings Technology
SN - 0257-8972
ER -