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Reactive Magnetron Sputtering of Zirconium Carbide Films Using Ar/CH4 Gas Mixtures

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Reactive Magnetron Sputtering of Zirconium Carbide Films Using Ar/CH4 Gas Mixtures. / Bruckner, J.; Mäntylä, T.

In: Surface and Coatings Technology, Vol. 59, 1993, p. 166-170.

Research output: Contribution to journalArticleScientificpeer-review

Harvard

Bruckner, J & Mäntylä, T 1993, 'Reactive Magnetron Sputtering of Zirconium Carbide Films Using Ar/CH4 Gas Mixtures', Surface and Coatings Technology, vol. 59, pp. 166-170.

APA

Bruckner, J., & Mäntylä, T. (1993). Reactive Magnetron Sputtering of Zirconium Carbide Films Using Ar/CH4 Gas Mixtures. Surface and Coatings Technology, 59, 166-170.

Vancouver

Bruckner J, Mäntylä T. Reactive Magnetron Sputtering of Zirconium Carbide Films Using Ar/CH4 Gas Mixtures. Surface and Coatings Technology. 1993;59:166-170.

Author

Bruckner, J. ; Mäntylä, T. / Reactive Magnetron Sputtering of Zirconium Carbide Films Using Ar/CH4 Gas Mixtures. In: Surface and Coatings Technology. 1993 ; Vol. 59. pp. 166-170.

Bibtex - Download

@article{1e08ce1f7fec481a9bd542e4522e0d57,
title = "Reactive Magnetron Sputtering of Zirconium Carbide Films Using Ar/CH4 Gas Mixtures",
author = "J. Bruckner and T. M{\"a}ntyl{\"a}",
note = "Contribution: organisation=mol,FACT1=1",
year = "1993",
language = "English",
volume = "59",
pages = "166--170",
journal = "Surface & Coatings Technology",
issn = "0257-8972",
publisher = "Elsevier",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Reactive Magnetron Sputtering of Zirconium Carbide Films Using Ar/CH4 Gas Mixtures

AU - Bruckner, J.

AU - Mäntylä, T.

N1 - Contribution: organisation=mol,FACT1=1

PY - 1993

Y1 - 1993

M3 - Article

VL - 59

SP - 166

EP - 170

JO - Surface & Coatings Technology

JF - Surface & Coatings Technology

SN - 0257-8972

ER -