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Stoichiometry and Impurities in Sputtered Alumina Films on Copper

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Stoichiometry and Impurities in Sputtered Alumina Films on Copper. / Vuoristo, P.; Mäntylä, T.; Kettunen, P.; Lappalainen, R.

In: Thin Solid Films, Vol. 204, 1991, p. 297-311.

Research output: Contribution to journalArticleScientificpeer-review

Harvard

Vuoristo, P, Mäntylä, T, Kettunen, P & Lappalainen, R 1991, 'Stoichiometry and Impurities in Sputtered Alumina Films on Copper', Thin Solid Films, vol. 204, pp. 297-311.

APA

Vuoristo, P., Mäntylä, T., Kettunen, P., & Lappalainen, R. (1991). Stoichiometry and Impurities in Sputtered Alumina Films on Copper. Thin Solid Films, 204, 297-311.

Vancouver

Vuoristo P, Mäntylä T, Kettunen P, Lappalainen R. Stoichiometry and Impurities in Sputtered Alumina Films on Copper. Thin Solid Films. 1991;204:297-311.

Author

Vuoristo, P. ; Mäntylä, T. ; Kettunen, P. ; Lappalainen, R. / Stoichiometry and Impurities in Sputtered Alumina Films on Copper. In: Thin Solid Films. 1991 ; Vol. 204. pp. 297-311.

Bibtex - Download

@article{7190ca3a45a84f5296e9fbd8f98a89c7,
title = "Stoichiometry and Impurities in Sputtered Alumina Films on Copper",
author = "P. Vuoristo and T. M{\"a}ntyl{\"a} and P. Kettunen and R. Lappalainen",
note = "Contribution: organisation=mol,FACT1=1<br/>Publisher name: Elsevier",
year = "1991",
language = "English",
volume = "204",
pages = "297--311",
journal = "Thin Solid Films",
issn = "0040-6090",
publisher = "Elsevier",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Stoichiometry and Impurities in Sputtered Alumina Films on Copper

AU - Vuoristo, P.

AU - Mäntylä, T.

AU - Kettunen, P.

AU - Lappalainen, R.

N1 - Contribution: organisation=mol,FACT1=1<br/>Publisher name: Elsevier

PY - 1991

Y1 - 1991

M3 - Article

VL - 204

SP - 297

EP - 311

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

ER -