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Third-harmonic UV generation in silicon nitride nanostructures

Research output: Contribution to journalArticleScientificpeer-review


Original languageEnglish
Pages (from-to)2012-2017
Number of pages6
JournalOptics Express
Issue number2
Publication statusPublished - 2013
Publication typeA1 Journal article-refereed


We report on strong UV third-harmonic generation from silicon nitride films and resonant waveguide gratings. We determine the absolute value of third-order susceptibility of silicon nitride at wavelength of 1064 nm to be χ⁽³⁾ (-3ω,ω,ω,ω) = (2.8 ± 0.6) × 10⁻²⁰ m²/V², which is two orders of magnitude larger than that of fused silica. The third-harmonic generation is further enhanced by a factor of 2000 by fabricating a resonant waveguide grating onto a silicon nitride film. Our results extend the operating range of CMOS-compatible nonlinear materials to the UV spectral regime.

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Field of science, Statistics Finland

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