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Third-harmonic UV generation in silicon nitride nanostructures

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Third-harmonic UV generation in silicon nitride nanostructures. / Ning, Tingyin; Hyvärinen, Outi; Pietarinen, Henna; Kaplas, Tommi; Kauranen, Martti; Genty, Goery.

In: Optics Express, Vol. 21, No. 2, 2013, p. 2012-2017.

Research output: Contribution to journalArticleScientificpeer-review

Harvard

Ning, T, Hyvärinen, O, Pietarinen, H, Kaplas, T, Kauranen, M & Genty, G 2013, 'Third-harmonic UV generation in silicon nitride nanostructures', Optics Express, vol. 21, no. 2, pp. 2012-2017. https://doi.org/10.1364/OE.21.002012

APA

Ning, T., Hyvärinen, O., Pietarinen, H., Kaplas, T., Kauranen, M., & Genty, G. (2013). Third-harmonic UV generation in silicon nitride nanostructures. Optics Express, 21(2), 2012-2017. https://doi.org/10.1364/OE.21.002012

Vancouver

Ning T, Hyvärinen O, Pietarinen H, Kaplas T, Kauranen M, Genty G. Third-harmonic UV generation in silicon nitride nanostructures. Optics Express. 2013;21(2):2012-2017. https://doi.org/10.1364/OE.21.002012

Author

Ning, Tingyin ; Hyvärinen, Outi ; Pietarinen, Henna ; Kaplas, Tommi ; Kauranen, Martti ; Genty, Goery. / Third-harmonic UV generation in silicon nitride nanostructures. In: Optics Express. 2013 ; Vol. 21, No. 2. pp. 2012-2017.

Bibtex - Download

@article{dd29fd9454c34a5d9cbe98348ebfa257,
title = "Third-harmonic UV generation in silicon nitride nanostructures",
abstract = "We report on strong UV third-harmonic generation from silicon nitride films and resonant waveguide gratings. We determine the absolute value of third-order susceptibility of silicon nitride at wavelength of 1064 nm to be χ⁽³⁾ (-3ω,ω,ω,ω) = (2.8 ± 0.6) × 10⁻²⁰ m²/V², which is two orders of magnitude larger than that of fused silica. The third-harmonic generation is further enhanced by a factor of 2000 by fabricating a resonant waveguide grating onto a silicon nitride film. Our results extend the operating range of CMOS-compatible nonlinear materials to the UV spectral regime.",
author = "Tingyin Ning and Outi Hyv{\"a}rinen and Henna Pietarinen and Tommi Kaplas and Martti Kauranen and Goery Genty",
note = "Contribution: organisation=fys,FACT1=0.7<br/>Contribution: organisation=orc,FACT2=0.3<br/>Portfolio EDEND: 2013-07-29<br/>Publisher name: Optical Society of America OSA",
year = "2013",
doi = "10.1364/OE.21.002012",
language = "English",
volume = "21",
pages = "2012--2017",
journal = "Opt. Express",
issn = "1094-4087",
publisher = "OPTICAL SOC AMER",
number = "2",

}

RIS (suitable for import to EndNote) - Download

TY - JOUR

T1 - Third-harmonic UV generation in silicon nitride nanostructures

AU - Ning, Tingyin

AU - Hyvärinen, Outi

AU - Pietarinen, Henna

AU - Kaplas, Tommi

AU - Kauranen, Martti

AU - Genty, Goery

N1 - Contribution: organisation=fys,FACT1=0.7<br/>Contribution: organisation=orc,FACT2=0.3<br/>Portfolio EDEND: 2013-07-29<br/>Publisher name: Optical Society of America OSA

PY - 2013

Y1 - 2013

N2 - We report on strong UV third-harmonic generation from silicon nitride films and resonant waveguide gratings. We determine the absolute value of third-order susceptibility of silicon nitride at wavelength of 1064 nm to be χ⁽³⁾ (-3ω,ω,ω,ω) = (2.8 ± 0.6) × 10⁻²⁰ m²/V², which is two orders of magnitude larger than that of fused silica. The third-harmonic generation is further enhanced by a factor of 2000 by fabricating a resonant waveguide grating onto a silicon nitride film. Our results extend the operating range of CMOS-compatible nonlinear materials to the UV spectral regime.

AB - We report on strong UV third-harmonic generation from silicon nitride films and resonant waveguide gratings. We determine the absolute value of third-order susceptibility of silicon nitride at wavelength of 1064 nm to be χ⁽³⁾ (-3ω,ω,ω,ω) = (2.8 ± 0.6) × 10⁻²⁰ m²/V², which is two orders of magnitude larger than that of fused silica. The third-harmonic generation is further enhanced by a factor of 2000 by fabricating a resonant waveguide grating onto a silicon nitride film. Our results extend the operating range of CMOS-compatible nonlinear materials to the UV spectral regime.

U2 - 10.1364/OE.21.002012

DO - 10.1364/OE.21.002012

M3 - Article

VL - 21

SP - 2012

EP - 2017

JO - Opt. Express

JF - Opt. Express

SN - 1094-4087

IS - 2

ER -