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Titanium Nitride Microelectrodes Deposited by Ion Beam Assisted E-beam Evaporation

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Titanium Nitride Microelectrodes Deposited by Ion Beam Assisted E-beam Evaporation. / Ryynänen, Tomi; Toivanen, Maria; Narkilahti, Susanna; Lekkala, Jukka .

2016. Paper presented at MEA meeting 2016, .

Research output: Other conference contributionPaper, poster or abstractScientific

Harvard

Ryynänen, T, Toivanen, M, Narkilahti, S & Lekkala, J 2016, 'Titanium Nitride Microelectrodes Deposited by Ion Beam Assisted E-beam Evaporation' Paper presented at MEA meeting 2016, 28/06/16 - 1/07/16, . https://doi.org/10.3389/conf.fnins.2016.93.00123

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Author

Ryynänen, Tomi ; Toivanen, Maria ; Narkilahti, Susanna ; Lekkala, Jukka . / Titanium Nitride Microelectrodes Deposited by Ion Beam Assisted E-beam Evaporation. Paper presented at MEA meeting 2016, .

Bibtex - Download

@conference{a6effbaf3bde4130b8a2d5034cb86120,
title = "Titanium Nitride Microelectrodes Deposited by Ion Beam Assisted E-beam Evaporation",
abstract = "An alternative method for fabricating titanium nitride (TiN) microelectrodes is presented. In order to decrease the impedance and noise levels of microelectrodes, one of the most common methods is to coat the electrodes with TiN. Usually that has required the use of a sputtering device, but we have demonstrated that also an e-beam coater can be used for TiN deposition, if equipped with an ion source. Our first 30 µm microelectrodes fabricated by ion beam assisted deposition (IBAD) have impedances around 75 kΩ, which is close to the impedances reported for sputter deposited TiN microelectrodes.",
keywords = "microelectrode, Titanium nitride, e-Beam evaporation, Ion beam assisted deposition, MEA",
author = "Tomi Ryyn{\"a}nen and Maria Toivanen and Susanna Narkilahti and Jukka Lekkala",
year = "2016",
month = "6",
day = "24",
doi = "10.3389/conf.fnins.2016.93.00123",
language = "English",
note = "MEA meeting 2016 ; Conference date: 28-06-2016 Through 01-07-2016",
url = "http://www.nmi.de/meameeting/",

}

RIS (suitable for import to EndNote) - Download

TY - CONF

T1 - Titanium Nitride Microelectrodes Deposited by Ion Beam Assisted E-beam Evaporation

AU - Ryynänen, Tomi

AU - Toivanen, Maria

AU - Narkilahti, Susanna

AU - Lekkala, Jukka

PY - 2016/6/24

Y1 - 2016/6/24

N2 - An alternative method for fabricating titanium nitride (TiN) microelectrodes is presented. In order to decrease the impedance and noise levels of microelectrodes, one of the most common methods is to coat the electrodes with TiN. Usually that has required the use of a sputtering device, but we have demonstrated that also an e-beam coater can be used for TiN deposition, if equipped with an ion source. Our first 30 µm microelectrodes fabricated by ion beam assisted deposition (IBAD) have impedances around 75 kΩ, which is close to the impedances reported for sputter deposited TiN microelectrodes.

AB - An alternative method for fabricating titanium nitride (TiN) microelectrodes is presented. In order to decrease the impedance and noise levels of microelectrodes, one of the most common methods is to coat the electrodes with TiN. Usually that has required the use of a sputtering device, but we have demonstrated that also an e-beam coater can be used for TiN deposition, if equipped with an ion source. Our first 30 µm microelectrodes fabricated by ion beam assisted deposition (IBAD) have impedances around 75 kΩ, which is close to the impedances reported for sputter deposited TiN microelectrodes.

KW - microelectrode

KW - Titanium nitride

KW - e-Beam evaporation

KW - Ion beam assisted deposition

KW - MEA

U2 - 10.3389/conf.fnins.2016.93.00123

DO - 10.3389/conf.fnins.2016.93.00123

M3 - Paper, poster or abstract

ER -