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Toward the Atomically Abrupt Interfaces of SiOx/Semiconductor Junctions

Research output: Contribution to journalArticleScientificpeer-review

Details

Original languageEnglish
Article number1500510
JournalAdvanced Materials Interfaces
Volume3
Issue number11
Early online date1 Mar 2016
DOIs
Publication statusPublished - Jun 2016
Publication typeA1 Journal article-refereed

Keywords

  • Interface reactions, Oxide films, Semiconductors, Spectroscopic methods, Transistors

Publication forum classification

Field of science, Statistics Finland