Toward the Atomically Abrupt Interfaces of SiOx/Semiconductor Junctions
Research output: Contribution to journal › Article › Scientific › peer-review
Details
| Original language | English |
|---|---|
| Article number | 1500510 |
| Journal | Advanced Materials Interfaces |
| Volume | 3 |
| Issue number | 11 |
| Early online date | 1 Mar 2016 |
| DOIs | |
| Publication status | Published - Jun 2016 |
| Publication type | A1 Journal article-refereed |
ASJC Scopus subject areas
Keywords
- Interface reactions, Oxide films, Semiconductors, Spectroscopic methods, Transistors