Toward the Atomically Abrupt Interfaces of SiOx/Semiconductor Junctions
Research output: Contribution to journal › Article › Scientific › peer-review
Details
Original language | English |
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Article number | 1500510 |
Journal | Advanced Materials Interfaces |
Volume | 3 |
Issue number | 11 |
Early online date | 1 Mar 2016 |
DOIs | |
Publication status | Published - Jun 2016 |
Publication type | A1 Journal article-refereed |
ASJC Scopus subject areas
Keywords
- Interface reactions, Oxide films, Semiconductors, Spectroscopic methods, Transistors