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A supramolecular approach to photoresponsive thermo/solvoplastic block copolymer elastomers

Tutkimustuotosvertaisarvioitu

Standard

A supramolecular approach to photoresponsive thermo/solvoplastic block copolymer elastomers. / Wang, Xin; Vapaavuori, Jaana; Zhao, Yue; Bazuin, C. Geraldine.

julkaisussa: Macromolecules, Vuosikerta 47, Nro 20, 28.10.2014, s. 7099-7108.

Tutkimustuotosvertaisarvioitu

Harvard

Wang, X, Vapaavuori, J, Zhao, Y & Bazuin, CG 2014, 'A supramolecular approach to photoresponsive thermo/solvoplastic block copolymer elastomers', Macromolecules, Vuosikerta. 47, Nro 20, Sivut 7099-7108. https://doi.org/10.1021/ma501278b

APA

Wang, X., Vapaavuori, J., Zhao, Y., & Bazuin, C. G. (2014). A supramolecular approach to photoresponsive thermo/solvoplastic block copolymer elastomers. Macromolecules, 47(20), 7099-7108. https://doi.org/10.1021/ma501278b

Vancouver

Wang X, Vapaavuori J, Zhao Y, Bazuin CG. A supramolecular approach to photoresponsive thermo/solvoplastic block copolymer elastomers. Macromolecules. 2014 loka 28;47(20):7099-7108. https://doi.org/10.1021/ma501278b

Author

Wang, Xin ; Vapaavuori, Jaana ; Zhao, Yue ; Bazuin, C. Geraldine. / A supramolecular approach to photoresponsive thermo/solvoplastic block copolymer elastomers. Julkaisussa: Macromolecules. 2014 ; Vuosikerta 47, Nro 20. Sivut 7099-7108.

Bibtex - Lataa

@article{44f3f0f8d1d34d17829e459730e4e020,
title = "A supramolecular approach to photoresponsive thermo/solvoplastic block copolymer elastomers",
abstract = "With the aim of preparing supramolecular photoresponsive block copolymer elastomers, a series of ABA triblock copolymers with a poly(n-butyl acrylate) (PnBA) middle block and poly(dimethylaminoethyl methacrylate) (PDMAEMA or PDM) outer blocks were synthesized by atom transfer radical polymerization (ATRP), followed by PDM quaternization (giving PDMQ-PnBA-PDMQ) and then by ionic complexation with methyl orange (MO), an azo-containing and sulfonate-functionalized commercially available compound (giving PDMQ/MO-PnBA-PDMQ/MO). The PnBA block, which has a subambient glass transition, and the quaternized and complexed blocks, which have high glass transitions, form phase-separated soft and hard blocks, respectively. Simple elasticity tests of solvent-cast films show that the PDMQ/MO-PnBA-PDMQ/MO with hard block content between 18 and 29 wt {\%} (as well as PDMQ-PnBA-PDMQ with 18 wt {\%} hard block content) have significant elastomeric character. AFM and TEM (atomic force and transmission electron microscopies) of spin-coated films show a correlation between the elastomeric character and morphologies where the hard block forms a dispersed minority phase (spherical and/or short cylindrical domains). A continuous hard phase is observed for a hard block content of around 37 wt {\%}; these materials show no significant elasticity. Reversible photoisomerization, with relatively high cis isomer content in the photostationary state, was also demonstrated.",
author = "Xin Wang and Jaana Vapaavuori and Yue Zhao and Bazuin, {C. Geraldine}",
year = "2014",
month = "10",
day = "28",
doi = "10.1021/ma501278b",
language = "English",
volume = "47",
pages = "7099--7108",
journal = "Macromolecules",
issn = "0024-9297",
publisher = "American Chemical Society",
number = "20",

}

RIS (suitable for import to EndNote) - Lataa

TY - JOUR

T1 - A supramolecular approach to photoresponsive thermo/solvoplastic block copolymer elastomers

AU - Wang, Xin

AU - Vapaavuori, Jaana

AU - Zhao, Yue

AU - Bazuin, C. Geraldine

PY - 2014/10/28

Y1 - 2014/10/28

N2 - With the aim of preparing supramolecular photoresponsive block copolymer elastomers, a series of ABA triblock copolymers with a poly(n-butyl acrylate) (PnBA) middle block and poly(dimethylaminoethyl methacrylate) (PDMAEMA or PDM) outer blocks were synthesized by atom transfer radical polymerization (ATRP), followed by PDM quaternization (giving PDMQ-PnBA-PDMQ) and then by ionic complexation with methyl orange (MO), an azo-containing and sulfonate-functionalized commercially available compound (giving PDMQ/MO-PnBA-PDMQ/MO). The PnBA block, which has a subambient glass transition, and the quaternized and complexed blocks, which have high glass transitions, form phase-separated soft and hard blocks, respectively. Simple elasticity tests of solvent-cast films show that the PDMQ/MO-PnBA-PDMQ/MO with hard block content between 18 and 29 wt % (as well as PDMQ-PnBA-PDMQ with 18 wt % hard block content) have significant elastomeric character. AFM and TEM (atomic force and transmission electron microscopies) of spin-coated films show a correlation between the elastomeric character and morphologies where the hard block forms a dispersed minority phase (spherical and/or short cylindrical domains). A continuous hard phase is observed for a hard block content of around 37 wt %; these materials show no significant elasticity. Reversible photoisomerization, with relatively high cis isomer content in the photostationary state, was also demonstrated.

AB - With the aim of preparing supramolecular photoresponsive block copolymer elastomers, a series of ABA triblock copolymers with a poly(n-butyl acrylate) (PnBA) middle block and poly(dimethylaminoethyl methacrylate) (PDMAEMA or PDM) outer blocks were synthesized by atom transfer radical polymerization (ATRP), followed by PDM quaternization (giving PDMQ-PnBA-PDMQ) and then by ionic complexation with methyl orange (MO), an azo-containing and sulfonate-functionalized commercially available compound (giving PDMQ/MO-PnBA-PDMQ/MO). The PnBA block, which has a subambient glass transition, and the quaternized and complexed blocks, which have high glass transitions, form phase-separated soft and hard blocks, respectively. Simple elasticity tests of solvent-cast films show that the PDMQ/MO-PnBA-PDMQ/MO with hard block content between 18 and 29 wt % (as well as PDMQ-PnBA-PDMQ with 18 wt % hard block content) have significant elastomeric character. AFM and TEM (atomic force and transmission electron microscopies) of spin-coated films show a correlation between the elastomeric character and morphologies where the hard block forms a dispersed minority phase (spherical and/or short cylindrical domains). A continuous hard phase is observed for a hard block content of around 37 wt %; these materials show no significant elasticity. Reversible photoisomerization, with relatively high cis isomer content in the photostationary state, was also demonstrated.

UR - http://www.scopus.com/inward/record.url?scp=84908299127&partnerID=8YFLogxK

U2 - 10.1021/ma501278b

DO - 10.1021/ma501278b

M3 - Article

VL - 47

SP - 7099

EP - 7108

JO - Macromolecules

JF - Macromolecules

SN - 0024-9297

IS - 20

ER -