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Atomic layer deposited iridium oxide thin film as microelectrode coating in stem cell applications

Tutkimustuotosvertaisarvioitu

Standard

Atomic layer deposited iridium oxide thin film as microelectrode coating in stem cell applications. / Ryynänen, Tomi; Ylä-Outinen, Laura; Narkilahti, Susanna; Tanskanen, Jarno M.A.; Hyttinen, Jari; Hämäläinen, Jani; Leskelä, Markku; Lekkala, Jukka.

julkaisussa: Journal of Vacuum Science & Technology A, Vuosikerta 30, Nro 4, 041501, 2012, s. 1-5.

Tutkimustuotosvertaisarvioitu

Harvard

Ryynänen, T, Ylä-Outinen, L, Narkilahti, S, Tanskanen, JMA, Hyttinen, J, Hämäläinen, J, Leskelä, M & Lekkala, J 2012, 'Atomic layer deposited iridium oxide thin film as microelectrode coating in stem cell applications', Journal of Vacuum Science & Technology A, Vuosikerta. 30, Nro 4, 041501, Sivut 1-5. https://doi.org/10.1116/1.4709447

APA

Ryynänen, T., Ylä-Outinen, L., Narkilahti, S., Tanskanen, J. M. A., Hyttinen, J., Hämäläinen, J., ... Lekkala, J. (2012). Atomic layer deposited iridium oxide thin film as microelectrode coating in stem cell applications. Journal of Vacuum Science & Technology A, 30(4), 1-5. [041501]. https://doi.org/10.1116/1.4709447

Vancouver

Ryynänen T, Ylä-Outinen L, Narkilahti S, Tanskanen JMA, Hyttinen J, Hämäläinen J et al. Atomic layer deposited iridium oxide thin film as microelectrode coating in stem cell applications. Journal of Vacuum Science & Technology A. 2012;30(4):1-5. 041501. https://doi.org/10.1116/1.4709447

Author

Ryynänen, Tomi ; Ylä-Outinen, Laura ; Narkilahti, Susanna ; Tanskanen, Jarno M.A. ; Hyttinen, Jari ; Hämäläinen, Jani ; Leskelä, Markku ; Lekkala, Jukka. / Atomic layer deposited iridium oxide thin film as microelectrode coating in stem cell applications. Julkaisussa: Journal of Vacuum Science & Technology A. 2012 ; Vuosikerta 30, Nro 4. Sivut 1-5.

Bibtex - Lataa

@article{a97d3b73f7704f8c9278a042c76b4383,
title = "Atomic layer deposited iridium oxide thin film as microelectrode coating in stem cell applications",
author = "Tomi Ryyn{\"a}nen and Laura Yl{\"a}-Outinen and Susanna Narkilahti and Tanskanen, {Jarno M.A.} and Jari Hyttinen and Jani H{\"a}m{\"a}l{\"a}inen and Markku Leskel{\"a} and Jukka Lekkala",
note = "Poistettu tupla r=1305.Julkaisufoorumin listalla virheellinen ISSN 1553-1813<br/>Contribution: organisation=ase mit,FACT1=0.8<br/>Contribution: organisation=bme,FACT2=0.2<br/>Publisher name: American Vacuum Society; American Institute of Physics",
year = "2012",
doi = "10.1116/1.4709447",
language = "English",
volume = "30",
pages = "1--5",
journal = "Journal of Vacuum Science & Technology A",
issn = "1553-1813",
number = "4",

}

RIS (suitable for import to EndNote) - Lataa

TY - JOUR

T1 - Atomic layer deposited iridium oxide thin film as microelectrode coating in stem cell applications

AU - Ryynänen, Tomi

AU - Ylä-Outinen, Laura

AU - Narkilahti, Susanna

AU - Tanskanen, Jarno M.A.

AU - Hyttinen, Jari

AU - Hämäläinen, Jani

AU - Leskelä, Markku

AU - Lekkala, Jukka

N1 - Poistettu tupla r=1305.Julkaisufoorumin listalla virheellinen ISSN 1553-1813<br/>Contribution: organisation=ase mit,FACT1=0.8<br/>Contribution: organisation=bme,FACT2=0.2<br/>Publisher name: American Vacuum Society; American Institute of Physics

PY - 2012

Y1 - 2012

U2 - 10.1116/1.4709447

DO - 10.1116/1.4709447

M3 - Article

VL - 30

SP - 1

EP - 5

JO - Journal of Vacuum Science & Technology A

JF - Journal of Vacuum Science & Technology A

SN - 1553-1813

IS - 4

M1 - 041501

ER -