Atomic layer deposited iridium oxide thin film as microelectrode coating in stem cell applications
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Standard
Atomic layer deposited iridium oxide thin film as microelectrode coating in stem cell applications. / Ryynänen, Tomi; Ylä-Outinen, Laura; Narkilahti, Susanna; Tanskanen, Jarno M.A.; Hyttinen, Jari; Hämäläinen, Jani; Leskelä, Markku; Lekkala, Jukka.
julkaisussa:
Journal of Vacuum Science & Technology A, Vuosikerta 30, Nro 4, 041501, 2012, s. 1-5.
Tutkimustuotos › › vertaisarvioitu
Harvard
Ryynänen, T, Ylä-Outinen, L, Narkilahti, S, Tanskanen, JMA
, Hyttinen, J, Hämäläinen, J, Leskelä, M & Lekkala, J 2012, '
Atomic layer deposited iridium oxide thin film as microelectrode coating in stem cell applications',
Journal of Vacuum Science & Technology A, Vuosikerta. 30, Nro 4, 041501, Sivut 1-5.
https://doi.org/10.1116/1.4709447
APA
Ryynänen, T., Ylä-Outinen, L., Narkilahti, S., Tanskanen, J. M. A.
, Hyttinen, J., Hämäläinen, J., ... Lekkala, J. (2012).
Atomic layer deposited iridium oxide thin film as microelectrode coating in stem cell applications.
Journal of Vacuum Science & Technology A,
30(4), 1-5. [041501].
https://doi.org/10.1116/1.4709447
Vancouver
Author
@article{a97d3b73f7704f8c9278a042c76b4383,
title = "Atomic layer deposited iridium oxide thin film as microelectrode coating in stem cell applications",
author = "Tomi Ryyn{\"a}nen and Laura Yl{\"a}-Outinen and Susanna Narkilahti and Tanskanen, {Jarno M.A.} and Jari Hyttinen and Jani H{\"a}m{\"a}l{\"a}inen and Markku Leskel{\"a} and Jukka Lekkala",
note = "Poistettu tupla r=1305.Julkaisufoorumin listalla virheellinen ISSN 1553-1813<br/>Contribution: organisation=ase mit,FACT1=0.8<br/>Contribution: organisation=bme,FACT2=0.2<br/>Publisher name: American Vacuum Society; American Institute of Physics",
year = "2012",
doi = "10.1116/1.4709447",
language = "English",
volume = "30",
pages = "1--5",
journal = "Journal of Vacuum Science & Technology A",
issn = "1553-1813",
number = "4",
}
RIS (suitable for import to EndNote) - Lataa
TY - JOUR
T1 - Atomic layer deposited iridium oxide thin film as microelectrode coating in stem cell applications
AU - Ryynänen, Tomi
AU - Ylä-Outinen, Laura
AU - Narkilahti, Susanna
AU - Tanskanen, Jarno M.A.
AU - Hyttinen, Jari
AU - Hämäläinen, Jani
AU - Leskelä, Markku
AU - Lekkala, Jukka
N1 - Poistettu tupla r=1305.Julkaisufoorumin listalla virheellinen ISSN 1553-1813<br/>Contribution: organisation=ase mit,FACT1=0.8<br/>Contribution: organisation=bme,FACT2=0.2<br/>Publisher name: American Vacuum Society; American Institute of Physics
PY - 2012
Y1 - 2012
U2 - 10.1116/1.4709447
DO - 10.1116/1.4709447
M3 - Article
VL - 30
SP - 1
EP - 5
JO - Journal of Vacuum Science & Technology A
JF - Journal of Vacuum Science & Technology A
SN - 1553-1813
IS - 4
M1 - 041501
ER -
