TUTCRIS

TY - JOUR

T1 - Fabrication of ssDNA/Oligo(ethylene glycol) monolayers and patterns by exchange reaction promoted by ultraviolet light irradiation

AU - Khan, M. Nuruzzaman

AU - Zharnikov, Michael

PY - 2013/11/27

Y1 - 2013/11/27

N2 - Using a representative test system, we present here a versatile approach to prepare mixed monolayers of thiolated single-stranded DNA (ssDNA) and oligo(ethylene glycol) substituted alkanethiols (OEG-AT) in a broad range of compositions as well as ssDNA/OEG-AT patterns of desired shape imbedded into a biorepulsive background. The procedure involves two steps. First, a primary, well-defined OEG-AT monolayer on a solid support is exposed to UV light in either homogeneous or lithographic fashion. Second, the exchange reaction between the damaged OEG-AT species in the film and ssDNA substituents in solution occurs, resulting in formation of ssDNA/OEG-AT monolayer or pattern. The above procedure relies on commercially available compounds and does not require vacuum, which simplifies its application in research and industrial laboratories. The composition of the mixed films or ssDNA/OEG-AT spots (lithography) can be precisely adjusted by UV dose in an almost entire composition range. It was demonstrated that the procedure can be performed with UV light of different wavelengths (254 or 365 nm), which opens new possibilities for lithography. Using advanced spectroscopic tools, it was shown that ssDNA molecules imbedded into the OEG-AT matrix maintain their identity and intact character as well as exhibit predominant upright orientation typical of one-component films of thiolated ssDNA. The OEG-AT constituents of the mixed monolayers were found to be intact as well, with all UV damaged OEG-AT species being exchanged for ssDNA. Finally, a representative ssDNA/OEG-AT pattern was fabricated.

AB - Using a representative test system, we present here a versatile approach to prepare mixed monolayers of thiolated single-stranded DNA (ssDNA) and oligo(ethylene glycol) substituted alkanethiols (OEG-AT) in a broad range of compositions as well as ssDNA/OEG-AT patterns of desired shape imbedded into a biorepulsive background. The procedure involves two steps. First, a primary, well-defined OEG-AT monolayer on a solid support is exposed to UV light in either homogeneous or lithographic fashion. Second, the exchange reaction between the damaged OEG-AT species in the film and ssDNA substituents in solution occurs, resulting in formation of ssDNA/OEG-AT monolayer or pattern. The above procedure relies on commercially available compounds and does not require vacuum, which simplifies its application in research and industrial laboratories. The composition of the mixed films or ssDNA/OEG-AT spots (lithography) can be precisely adjusted by UV dose in an almost entire composition range. It was demonstrated that the procedure can be performed with UV light of different wavelengths (254 or 365 nm), which opens new possibilities for lithography. Using advanced spectroscopic tools, it was shown that ssDNA molecules imbedded into the OEG-AT matrix maintain their identity and intact character as well as exhibit predominant upright orientation typical of one-component films of thiolated ssDNA. The OEG-AT constituents of the mixed monolayers were found to be intact as well, with all UV damaged OEG-AT species being exchanged for ssDNA. Finally, a representative ssDNA/OEG-AT pattern was fabricated.

UR - http://www.scopus.com/inward/record.url?scp=84889582340&partnerID=8YFLogxK

U2 - 10.1021/jp408819k

DO - 10.1021/jp408819k

M3 - Article

VL - 117

SP - 24883

EP - 24893

JO - Journal of Physical Chemistry C

JF - Journal of Physical Chemistry C

SN - 1932-7447

IS - 47

ER -