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Nanoscale structures for implementation of anti-reflection and self-cleaning functions

Tutkimustuotosvertaisarvioitu

Standard

Nanoscale structures for implementation of anti-reflection and self-cleaning functions. / Wang, Z.; Zhang, J.; Hang, L.; Jiang, S.; Liu, G.; Ji, Z.; Tan, C.; Sun, H.

julkaisussa: International Journal of Nanomanufacturing, Vuosikerta 9, Nro 5-6, 2013, s. 520-531.

Tutkimustuotosvertaisarvioitu

Harvard

Wang, Z, Zhang, J, Hang, L, Jiang, S, Liu, G, Ji, Z, Tan, C & Sun, H 2013, 'Nanoscale structures for implementation of anti-reflection and self-cleaning functions', International Journal of Nanomanufacturing, Vuosikerta. 9, Nro 5-6, Sivut 520-531. https://doi.org/10.1504/IJNM.2013.057596

APA

Wang, Z., Zhang, J., Hang, L., Jiang, S., Liu, G., Ji, Z., ... Sun, H. (2013). Nanoscale structures for implementation of anti-reflection and self-cleaning functions. International Journal of Nanomanufacturing, 9(5-6), 520-531. https://doi.org/10.1504/IJNM.2013.057596

Vancouver

Wang Z, Zhang J, Hang L, Jiang S, Liu G, Ji Z et al. Nanoscale structures for implementation of anti-reflection and self-cleaning functions. International Journal of Nanomanufacturing. 2013;9(5-6):520-531. https://doi.org/10.1504/IJNM.2013.057596

Author

Wang, Z. ; Zhang, J. ; Hang, L. ; Jiang, S. ; Liu, G. ; Ji, Z. ; Tan, C. ; Sun, H. / Nanoscale structures for implementation of anti-reflection and self-cleaning functions. Julkaisussa: International Journal of Nanomanufacturing. 2013 ; Vuosikerta 9, Nro 5-6. Sivut 520-531.

Bibtex - Lataa

@article{95ddb70d510f4f62bf2391e965f1ae5b,
title = "Nanoscale structures for implementation of anti-reflection and self-cleaning functions",
author = "Z. Wang and J. Zhang and L. Hang and S. Jiang and G. Liu and Z. Ji and C. Tan and H. Sun",
note = "Contribution: organisation=orc,FACT1=1<br/>Portfolio EDEND: 2013-12-29<br/>Publisher name: Inderscience Publishers",
year = "2013",
doi = "10.1504/IJNM.2013.057596",
language = "English",
volume = "9",
pages = "520--531",
journal = "International Journal of Nanomanufacturing",
issn = "1746-9392",
publisher = "Inderscience",
number = "5-6",

}

RIS (suitable for import to EndNote) - Lataa

TY - JOUR

T1 - Nanoscale structures for implementation of anti-reflection and self-cleaning functions

AU - Wang, Z.

AU - Zhang, J.

AU - Hang, L.

AU - Jiang, S.

AU - Liu, G.

AU - Ji, Z.

AU - Tan, C.

AU - Sun, H.

N1 - Contribution: organisation=orc,FACT1=1<br/>Portfolio EDEND: 2013-12-29<br/>Publisher name: Inderscience Publishers

PY - 2013

Y1 - 2013

U2 - 10.1504/IJNM.2013.057596

DO - 10.1504/IJNM.2013.057596

M3 - Article

VL - 9

SP - 520

EP - 531

JO - International Journal of Nanomanufacturing

JF - International Journal of Nanomanufacturing

SN - 1746-9392

IS - 5-6

ER -