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Resistance measurements in conductive fabrics

Tutkimustuotosvertaisarvioitu

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Resistance measurements in conductive fabrics. / Pola, Taina; Vanhala, Jukka.

2011 International Conference on Advanced Material Research, ICAMR 2011, January 21 - January 23, 2011, Chongqing, China. Advanced Materials Research. toim. / Yushu Zhang. Switzerland : Trans Tech Publications, 2011. s. 121-125 (International Conference on Advanced Material Research ICAMR; Vuosikerta 213).

Tutkimustuotosvertaisarvioitu

Harvard

Pola, T & Vanhala, J 2011, Resistance measurements in conductive fabrics. julkaisussa Y Zhang (Toimittaja), 2011 International Conference on Advanced Material Research, ICAMR 2011, January 21 - January 23, 2011, Chongqing, China. Advanced Materials Research. International Conference on Advanced Material Research ICAMR, Vuosikerta. 213, Trans Tech Publications, Switzerland, Sivut 121-125. https://doi.org/10.4028/www.scientific.net/AMR.213.121

APA

Pola, T., & Vanhala, J. (2011). Resistance measurements in conductive fabrics. teoksessa Y. Zhang (Toimittaja), 2011 International Conference on Advanced Material Research, ICAMR 2011, January 21 - January 23, 2011, Chongqing, China. Advanced Materials Research (Sivut 121-125). (International Conference on Advanced Material Research ICAMR; Vuosikerta 213). Switzerland: Trans Tech Publications. https://doi.org/10.4028/www.scientific.net/AMR.213.121

Vancouver

Pola T, Vanhala J. Resistance measurements in conductive fabrics. julkaisussa Zhang Y, toimittaja, 2011 International Conference on Advanced Material Research, ICAMR 2011, January 21 - January 23, 2011, Chongqing, China. Advanced Materials Research. Switzerland: Trans Tech Publications. 2011. s. 121-125. (International Conference on Advanced Material Research ICAMR). https://doi.org/10.4028/www.scientific.net/AMR.213.121

Author

Pola, Taina ; Vanhala, Jukka. / Resistance measurements in conductive fabrics. 2011 International Conference on Advanced Material Research, ICAMR 2011, January 21 - January 23, 2011, Chongqing, China. Advanced Materials Research. Toimittaja / Yushu Zhang. Switzerland : Trans Tech Publications, 2011. Sivut 121-125 (International Conference on Advanced Material Research ICAMR).

Bibtex - Lataa

@inproceedings{f919eada9c6745e6842e9fb39099c098,
title = "Resistance measurements in conductive fabrics",
author = "Taina Pola and Jukka Vanhala",
note = "Contribution: organisation=ele,FACT1=1",
year = "2011",
doi = "10.4028/www.scientific.net/AMR.213.121",
language = "English",
isbn = "978-303785061-9",
series = "International Conference on Advanced Material Research ICAMR",
publisher = "Trans Tech Publications",
pages = "121--125",
editor = "Yushu Zhang",
booktitle = "2011 International Conference on Advanced Material Research, ICAMR 2011, January 21 - January 23, 2011, Chongqing, China. Advanced Materials Research",

}

RIS (suitable for import to EndNote) - Lataa

TY - GEN

T1 - Resistance measurements in conductive fabrics

AU - Pola, Taina

AU - Vanhala, Jukka

N1 - Contribution: organisation=ele,FACT1=1

PY - 2011

Y1 - 2011

U2 - 10.4028/www.scientific.net/AMR.213.121

DO - 10.4028/www.scientific.net/AMR.213.121

M3 - Conference contribution

SN - 978-303785061-9

T3 - International Conference on Advanced Material Research ICAMR

SP - 121

EP - 125

BT - 2011 International Conference on Advanced Material Research, ICAMR 2011, January 21 - January 23, 2011, Chongqing, China. Advanced Materials Research

A2 - Zhang, Yushu

PB - Trans Tech Publications

CY - Switzerland

ER -