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Toward the Atomically Abrupt Interfaces of SiOx/Semiconductor Junctions

Tutkimustuotosvertaisarvioitu

Standard

Toward the Atomically Abrupt Interfaces of SiOx/Semiconductor Junctions. / Kuzmin, Mikhail; Laukkanen, Pekka; Mäkelä, Jaakko; Yasir, Muhammad; Tuominen, Marjukka; Dahl, Johnny; Punkkinen, Marko P J; Kokko, Kalevi; Hedman, Hannu Pekka; Moon, Jongyun; Punkkinen, Risto; Lastusaari, Mika; Polojärvi, Ville; Korpijärvi, Ville-Markus; Guina, Mircea.

julkaisussa: Advanced Materials Interfaces, Vuosikerta 3, Nro 11, 1500510, 06.2016.

Tutkimustuotosvertaisarvioitu

Harvard

Kuzmin, M, Laukkanen, P, Mäkelä, J, Yasir, M, Tuominen, M, Dahl, J, Punkkinen, MPJ, Kokko, K, Hedman, HP, Moon, J, Punkkinen, R, Lastusaari, M, Polojärvi, V, Korpijärvi, V-M & Guina, M 2016, 'Toward the Atomically Abrupt Interfaces of SiOx/Semiconductor Junctions', Advanced Materials Interfaces, Vuosikerta. 3, Nro 11, 1500510. https://doi.org/10.1002/admi.201500510

APA

Kuzmin, M., Laukkanen, P., Mäkelä, J., Yasir, M., Tuominen, M., Dahl, J., ... Guina, M. (2016). Toward the Atomically Abrupt Interfaces of SiOx/Semiconductor Junctions. Advanced Materials Interfaces, 3(11), [1500510]. https://doi.org/10.1002/admi.201500510

Vancouver

Kuzmin M, Laukkanen P, Mäkelä J, Yasir M, Tuominen M, Dahl J et al. Toward the Atomically Abrupt Interfaces of SiOx/Semiconductor Junctions. Advanced Materials Interfaces. 2016 kesä;3(11). 1500510. https://doi.org/10.1002/admi.201500510

Author

Kuzmin, Mikhail ; Laukkanen, Pekka ; Mäkelä, Jaakko ; Yasir, Muhammad ; Tuominen, Marjukka ; Dahl, Johnny ; Punkkinen, Marko P J ; Kokko, Kalevi ; Hedman, Hannu Pekka ; Moon, Jongyun ; Punkkinen, Risto ; Lastusaari, Mika ; Polojärvi, Ville ; Korpijärvi, Ville-Markus ; Guina, Mircea. / Toward the Atomically Abrupt Interfaces of SiOx/Semiconductor Junctions. Julkaisussa: Advanced Materials Interfaces. 2016 ; Vuosikerta 3, Nro 11.

Bibtex - Lataa

@article{becbc6ee45044ee0a54d1ab3f6f445db,
title = "Toward the Atomically Abrupt Interfaces of SiOx/Semiconductor Junctions",
keywords = "Interface reactions, Oxide films, Semiconductors, Spectroscopic methods, Transistors",
author = "Mikhail Kuzmin and Pekka Laukkanen and Jaakko M{\"a}kel{\"a} and Muhammad Yasir and Marjukka Tuominen and Johnny Dahl and Punkkinen, {Marko P J} and Kalevi Kokko and Hedman, {Hannu Pekka} and Jongyun Moon and Risto Punkkinen and Mika Lastusaari and Ville Poloj{\"a}rvi and Ville-Markus Korpij{\"a}rvi and Mircea Guina",
year = "2016",
month = "6",
doi = "10.1002/admi.201500510",
language = "English",
volume = "3",
journal = "Advanced Materials Interfaces",
issn = "2196-7350",
publisher = "Wiley",
number = "11",

}

RIS (suitable for import to EndNote) - Lataa

TY - JOUR

T1 - Toward the Atomically Abrupt Interfaces of SiOx/Semiconductor Junctions

AU - Kuzmin, Mikhail

AU - Laukkanen, Pekka

AU - Mäkelä, Jaakko

AU - Yasir, Muhammad

AU - Tuominen, Marjukka

AU - Dahl, Johnny

AU - Punkkinen, Marko P J

AU - Kokko, Kalevi

AU - Hedman, Hannu Pekka

AU - Moon, Jongyun

AU - Punkkinen, Risto

AU - Lastusaari, Mika

AU - Polojärvi, Ville

AU - Korpijärvi, Ville-Markus

AU - Guina, Mircea

PY - 2016/6

Y1 - 2016/6

KW - Interface reactions

KW - Oxide films

KW - Semiconductors

KW - Spectroscopic methods

KW - Transistors

U2 - 10.1002/admi.201500510

DO - 10.1002/admi.201500510

M3 - Article

VL - 3

JO - Advanced Materials Interfaces

JF - Advanced Materials Interfaces

SN - 2196-7350

IS - 11

M1 - 1500510

ER -